61_125 inox ouro japonez
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Vol. 61, 2, 2010 2 125
5 10
5 10
11
111
10
1990
10
TSVThrough Silicon Via
1
CPU
2002
CPU
2
4
1
1
-
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46
60 126
a
20.2mm, 0.1mm
bCPU
4
3 a
b
a b
4TSV
3TSV
Si TSV
TSV
TSV
,
TSV
TSV
TSV
4
TSV
P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans and H.
DeligianniIBM J. Res. & Devel., 42, 5671998.
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12, 1042009.
112
1
2
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Vol. 61, 2, 2010 2 127
pH
2001710mg/L
40g/L
280g/L 45g/L 21g/L
pH 454050
pH
2
pH
2
40wt%
3
0.6g/L 8.0g/L
300g/L
0.02g/L 60g/L
0.05g/L 45wt%
0.1474mol/L
0.0526mol/L 1mol/LL-
0.4mol/LPOEN --
3g/L
40mass%
40g/L
20g/L4 20g/L 200g/L
40wt%Cu-Sn
3
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48
60 128
MEMSMicro Electro Mechanical Systems
Kim
Vitek 5-
5-
50 58mass
PRPR
4
pH 7
2 pH 10 11
UV
51, 718
2000.
T.Doi, K.mizumoto, S.Tanaka and T.YamashitaMetal Finishing,
102,4, 262004.
F.Saito, K.Kishimoto, Y.Nobira, K.Kobayakawa and Y.SatoMetal
Finishing, 150,12, 342007.
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2009161804
S.K.KimJ.E.BonevichD.Josell and T.P.MoffatJourna l of
Electrochemical Society, 154, 4432007.
J.VitekP.Nejedly and F.KristoforyPlating & Surface Finishing,
88,12, 612001.
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11
112p.492005.
12Peter T.TangElectrochimica Acta, 47, 612001.
13 17,
No.5, 12004.
1416, No.6, 12003.
113
/
1920
Sargent
CrO:HSO 100:1
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Vol. 61, 2, 2010 2 129
13 16 %
20 m/h
6
1940
25 %
SRHS 1945
2 2
1984
25 %
1100 HV
10
RoHS WEEE
PFOS
6
6 EPA
0.01 mg/m 90
3
3
6
3
3
HVOF
Ni-P
10
1
Chromispel 500
750 g/L 80
100 mL/LHI HIO
15 30 20 200 A/dm 70 %
300 700 m/h
700 1200 HV
pH 2 400 g/L,
58 g/L, 0.75 g/L
20 20 90 A/dm
30 33 %
100 A/dm
64.8 % 17.1 m/min
65 70 100 200 A/dm
200 m/h
2
60
PR
on-o time
1300 Mpa
100
1
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50
60 130
5 m
ZrOSiCWC
0.1 0.9 wt%
3
2000 2005 3 6
3 6
26
3
6
3
6
3
6
CuNiFe
3
6
6
3
3
pH
100 m
3
Cr-P-C Cr-Ni
3
Fe
20 g/L
CrPb/TiPt/TiDSA
R.Mantscheva, I.Nenov and I.Gadjov ; Galvanotechnik, 90, 1273
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11R.P.Renz, J.J.Fortman, E.J.Taylor and M.E.Inman ;Plat. Surf. Finish.,
90,6, 522003
114
6
3
3
1
20 8m
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Vol. 61, 2, 2010 2 131
40kg 1 70
0.7A/dm A
CO
6 3
6
3 6
6
3
6
6
6
3
6 3
6
EN15205
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6
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6
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A
B
C
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1
A m B A C A D A E A
10.85 0.74 0.49 0.64 0.45 0.58
7.92 0.88 0.71 0.72 0.65 0.72
10.13 0.9 0.72 0.72 0.58 0.73
1
2
3 3
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52
60 132
Si
3
2
3
6
0.4 0.6
6 6
6 10
6
12 15
60 70
1
115
LiSn
1000mAh/g
LiC 2.5
1990
2000
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Vol. 61, 2, 2010 2 133
1940
CuSn 150-
200 CuSn CuSn
CuSn
CuSn
CuSn
CuSn
,CuSn
2
,,
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54
60 134
FIB
EBSD
SEM-FIB
FIB
; p. 128
2004.
; p. 3342006.
;
p. 3R&D
2006.
;
68, 5522004.
; 8, 12003.
; 49, 432009.
; ,
72, 1682008.
; 58, 4062007.
;
72, 6482008.
10
; 59, 9132008.
11; 58, 4452007.
12; 13, 6762008.
116
1
1
2
SUS
2
2 EDTA
,
0.2 0.3%
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130
250HV
3
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Vol. 61, 2, 2010 2 135
4
EDTA
,
99.99%
6090HV
5
ppm
6
EDTA
99.99% 80
100HV
NE
7
5,5 1,5,5
1
-
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56
60 136
pm
2
p.15, 1992.
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117
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G.R. Elkington
30 40
1990
40 600.3
5A/dm pH 4 1 0
pH
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57
Vol. 61, 2, 2010 2 137
pH 8 10 20 40 0.5
2A/dm
10
20 30
2 5A/dm
20 30
0.5 2A/dm
SUS 304
450 10
a
b
SUS 316410
LED
LED
LED
a) b)
a) b)
1
a : AgCN 4g/L
KCN 80g/L252.5A/dm2 : AgCN 40g/L,
KCN 110g/L, K2CO330g/L251A/dm2b
SUS 304450 10
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60 138
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; ,
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;
51, 10212000.
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12
121
ABS
Plating on Plastic : POP
Plating Through Hole : PTH
4
pH
1980
Direct Plating
1990 10
1990
2000
2000
Resin Coated Copper : RCC
0.2mm Blind
Via Hole : BVH
Multi
Purpose Unit : MPU
Bare Dielectric
Resin
SEM
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Vol. 61, 2, 2010 2 139
1m
0.2
0.3m
0.4 0.7m
Particle
m
Non Discloser Agreement : NDA
10
10
58, 812007.
59, 2822008.
59, 5702008.
3
p.741, 2006.
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Ni-P
DMAB Ni-B
Ni-P
WCuCoFe MoSn
PTFE
Ni-P
pH
Ni-P
1 3%
4 9%10 13%
P 1 3%
ITO
1 SEM
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60
60 140
P 4 9%Au
P 1013%
Ni B B 0.3 3%
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WEEE
RoHS
RoHS
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Ni-B
B 0.1 3% Ni-P
DMAB
Ni-PNi-B
Mg
Mg
Mg
Ni-P
20
3.5
Ni/ ENIG
ENIG
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Vol. 61, 2, 2010 2 141
Ni/Au Ni
Al FC
,
FPC
ITO
pH
LTCC
pH 6 8
3
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2 Pd
1 Pd
Pd Cu
Ni Ni
Cu
Cu Pd
Pd
Pd
PdCl
Cu
Cu Pd
Pd Ni PdNHCl NHCl
Cu Pd
Pd
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62
60 142
2 Pd
Pd Au Au
Pd Au
Pd Pd Pd- P
Pd
Pd Pd-P
Pd-P Pd Pd-P
Pd Pd-P Au
Pd Pd-P
Pd-P Pd Pd-P>Pd
3 Au
1 Au
Ni/ Au
Au
30nm 100nm Au
Au
Au
2 Au
1980 Au
Au
Au
Au
Au
Au
Au
Au
Au
4Ni/Pd/Au
Pd/ Au
Au 30nm
Pd Pd-P Pd/ Au
Ni/ Au
BGABall Grid Array
CSPChip Scale Package
Au
Ni/Pd/ Au/ Au
Ni/Pd/Au
1Ni/Pd/Au
HASLOSP
Ni/ Au
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Ni/Au
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Au
Ni/ Au/ Au
Pd
Ni/Pd/Au
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Au
Ni/Au
Au Ni/Pd/Au
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Ni/Au
10 Ni/
Au
Ni/ Au
Ni/
Pd/Au ,
Ni/ Au
Ni/ Au 1997
Ni
P
Au Ni
Ni/Pd/Au
Ni Au
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Vol. 61, 2, 2010 2 143
Pd
Ni/Pd/Au
Ni/Au Ni/Pd/
Au
Ni/Pd/
Au 2006
JEDEC 10mm/
Ni/Pd/Au
Ni/Au
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Au
Au
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Au
Au
Pd
Au Au Au
Au
Ni/Pd/ Au/ Au
5
Pd
Au
Ni/Pd/Au
Ni/Pd/
Au
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131
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80 90%
GA
Continuous Galvanizing Line ; CGL
GA
GA
Fe-Zn
Fe-Zn
GA
GA
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64
60 144
Fe-Zn
FIB
GA CGL
Fe
2
GA 90 2000
CO
GA
GA TS 270MPa
440MPa
SiMn CGL
SiMn
SiMn m
2000
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GA
Fe-Zn-Al
GA
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Mg
Zn-Al-Mg
2 Zn-Al-Mg
1
Zn-Al-Mg
b
1 Zn-6%Al-3%Mg
abZn/Al"/Zn2Mg
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Al Zn/Al/ZnMg Zn/Al /
ZnMg Zn ZnMg
Al Zn/Al/
ZnMg Zn-Al-Mg
Mg Al
Zn-Al-Mg
ZnMg
150 Zn
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Zn
2
Zn-Al-Mg
Zn
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CCTJIS H8502 1/10
1/4 ,
CCT20 Zn-6%Al-3%Mg
SEM-EDX
Mg Al Zn-6%Al-3%Mg
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2 Zn-6%Al-3%Mg
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60 146
Al Fe-Al-
Si IF Al
280mm
Al
3Zn GINi 2 Zn GI
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Zn
45g/m Ni
5g/m Ni
4 Sn-Zn
Sn-Zn Sn Zn
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7 9 %Zn Sn
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EBEP
3
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12
3 DLCdiamond-like carbon
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TiNTiAlNTiC
CrN 51 50 27 30
DLC 55 28%
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1000
500 /g
C/C CFRP
C CFRP
Easton CNT
CFRP
2005
10
50
CNT
5 mm
SWCNT
600
CNT
CNT
FET ITO
CNT
2
SWCNT SWCNT
787 13 840 50 %
CFRP
3
10
CFRP
240
cm
SpDiamond Technology
350 375 mm
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KF2HF
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LED GaN
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FeRAM
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PbZr,TiO Ba,SrTiO, BiTiO
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YBCO Bi Hg Tl
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