amc控制方法與案例介紹 - l&k eng 1page.pdf · 2017-04-14 · confidential, unpublished...

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AMCAMC控制方法控制方法與案例介紹與案例介紹

講員：亞翔工程股份有限公司技術中心研發組經理楊政諭


Fundamental Concept for AMC ControlFundamental Concept for AMC Control

AMCAMCAMCTotal SolutionTotal SolutionTotal SolutionEngineering

Site EvaluationSystem Plan / Design

Sampling & Monitoring Method Control Method / Installation

Yield / ProfitYield / Profitandand

Time to MarketTime to Market

Process ToolProcess Design / Process Layout

Product CharacteristicsProcess Chemical Usage

Enterprise

EnvironmentWeather Characteristics

ContaminantsContamination Dispersion

Air Flow Pattern

Threat / EffectThreat / Effect

Concept / IdeaConcept / Idea

ApplicationApplication


ZeroZero--in for Engineeringin for Engineering

Dilute Control

Isolation Control

Removal Control

Source Control

Yieldand

Profit


Dilute Control (I)Dilute Control (I)• Dilute control is the basic way for AMC control.

• The popular approach is the applications of outside makeup air and this is the reason why air washer, at least, should be installed for pre-filtration.

• The concept of dilute control is based on the following equation,

• The higher the makeup air volume and the lower the OA concentration, the lower the cleanroom concentration.

• This approach is recommended for product full operation only.

+C=C OA‧

GOA


Dilute Control (II)Dilute Control (II)Is the dilute control available for any kinds of AMC

problem？

From the basic equation, the answer seems yes but actually no. Basically, dilute control is suitable for steady state conditions. If an unsteady state problem is required, it will not be the best choice. Because sometimes you cannot use timing to exchange defect losses.


Concerning of Unsteady StateConcerning of Unsteady StateAs mentioned before, the steady state will follow up the

basic equation. What will happen to unsteady state？

Normally, the unsteady state will happen for spill accident or new building starting.

0

5

10

15

20

25

30

0 10 20 30 40 50 60

Escape Time (Day)

Cle

anro

om

Conce

ntr

atio

n (

ppb)

Chemical Filter Coverage 0%Chemical Filter Coverage 1.8% (Now)Chemical Filter Coverage 10%Chemical Filter Coverage 20%Chemical Filter Coverage 30%SpecificationsOutgassing of ammonia

from newly constructed FAB and the difference

between pure dilute and removal aided

inside FAB.


Effective Usage of Combination of Dilute/RemovalEffective Usage of Combination of Dilute/Removal

Damper 1

Damper 2

Damper 3

Monitor Point

Ducted Chemical Filter Unit (DCFU)Ducted Chemical Filter Unit (DCFU)

Chemical Filter

Patent Pending No.

No. 95118847( Taiwan, ROC )No. 200610087018.5(China)


Source Control (I)Source Control (I)• Source control is the first priority for AMC control. It

reduces the contamination on where the AMC generates.

• Outside air should be purified by air washer or other equipments.

• Fab Construction Consideration– Low outgassing architecture material – Low outgassing HEPA / ULPA filter

Low outgassing filterPTFE filterLow Boron filter

• Low outgassing tool selection due to higher usage of plastic material for tool


Source Control (II)Source Control (II)Who will be the most potential sources？

The answer is processes themselves, including inbetween different processes or its process itself ! But sometimes the persons who are in charge of AMC control are the last one to know real situation !

And this will be the big troubles when handling with AMC problems !


FFU FFU FFU

Chamber

Source from Process Itself (I)Source from Process Itself (I)

Carbon, nitrogen and oxygen were found on the defects by EDX.


Source from Process Itself (II)Source from Process Itself (II)• Mechanism of wafer to suffer contamination：

1. Stripper is flying up due to spin actions inside chamber.2. Air flow from tool FFU carries the stripper to the tool ambient.3. Contaminants trapped by vortex and spreading out by diffusion.4. Contaminants carried to wafer waiting area.5. Contamination happens.

1

2

3

3

4 5


Source and Defect Identification (I)Source and Defect Identification (I)

Wafer cassette transferring flow

Wafer pod unload port

Wafer pod load port

Wafer processing flow

Wafer waiting area

Wafer waiting area

Aluminum was corroded by chlorine.

Reaction Chamber


Source and Defect Identification (II)Source and Defect Identification (II)

AlPR PR

TiN ARC

After exposure/developingAl

PR PRTransfer/Waiting

Ti/TiN

Dry Etch

Chlorine Plasma Etching

Residue of chlorine on the photoresistsurface

Transfer/Waiting

PR PR

StrippingUSG

AlAl

1.Wet Processing

2.EKC270

3.Final Rinse DI/IPA

Transfer/Waiting

Thin Film Process


Isolation Control (I)Isolation Control (I)• The purpose of isolation control is to protect good people

in a closed environment from bothering by bad people or just put bad people into prison to isolate bad people.

• To isolate target area from truss to RAP is normally used.• Whether negative or positive pressure relative to other

area depends on the applications of isolated area.• An independent temperature and humidity control system

are recommended for special process area if necessary.• A combination of isolation and removal control or aided by

dilute control is also available if necessary.


Isolation Control (II)Isolation Control (II)Could the isolation approach effectively isolate the

contamination spreading？

The real situation is not so easy.

There exist some processes connection concern or some interface tools. How could you do with them？

If neglecting the potential cross communication via such route, even very small, the isolation may still fail to behave what we expect.


Checking of Isolation Effectiveness (I)Checking of Isolation Effectiveness (I)

RAP Truss


Checking of Isolation Effectiveness (II)Checking of Isolation Effectiveness (II)

RAP Truss


Removal Control (I)Removal Control (I)• Removal approach normally is the final solution but

sometimes more efficient and costive.• The way of removal control is to take the contaminants out

of cleanroom air via physical, chemical or hybrid of the above methods.

• Sometimes the removal control will be accompanied with isolation control.

• Normally, the best way to use removal control is near the process which you want to protect.


Removal Control (II)Removal Control (II)Could any removal control effectively solve all AMC

problems？

The real situation is not. It sometimes depends on what kinds of removal approaches you select.

As we know, the removal control normally means the applications of chemical filters. But even chemical filters, there exist many differences between different makers and this will result in the effectiveness of removal approach.


A Case StudyA Case StudyA chlorine corrosion problem happens in

one FAB and the chemical filter was planned to install on the top of ULPA.

Effective height is 40mm with two layers of media

Foam typeIon exchange for anionAPF-F-Aix2

Both filters are 68mm height.

Pleated typeActivated carbon (upstream) + Impregnated carbon (downstream)APF-P-C + APF-P-A

Effective height is 40mm with two layers of media

Foam typeIon exchange for corrosive gasesAPF-F-CRix2

68mm heightPleated typeImpregnated carbonAPF-P-A

Media or Filter HeightFilter TypeMedia CharacteristicsDescription

Filter Type

OK

NG

NG

OK

Judgment

95.69

19.179

69.186

85.5～99

Removal Efficiency

0.055

0.100

0.141


Classifications of Chemical FilterClassifications of Chemical Filter

Low

Low

Slurry Coated

PU foam Type

High

Few

Micro-granular Loaded

Ion ExchangeCarbon / Al2O3

HighModerateHighHighLow but also for particle

Absorption Performance

FewVery HighFewFewFewParticle Shedding

Figure

HoneycombTray TypePU foam TypeMicro-

granular Loaded

Carbon Fiber MediaType

Zeolite / Carbon Ion ExchangeCarbon

Main Matrix Material

PassthroughBreak through

Air ContactStyle


Concept CommunicationsConcept CommunicationsA sulfur compounds handling will be studied here to share and

communicate with you some concept. A normal sulfur-compounds solutions will be as follow,

Air Washer provides the first removal line but only for SOx.

The chemical filters provide the second / third protection stage. For this applications, normally H2S and organosulfate will be targets.

Chemical filter installedon the top of FFU.


Chemical Filter ClassificationsChemical Filter Classifications

Condensables(AC ,activated carbon,filter) or TS filter

Impregnated carbon (Acid filter) or TS filter

Impregnated carbon (Acid filter) or TS filter

Available Chemical Filter

Type

304580( 20ppb

< 1ppb

1 ～ 10ppb

10 ～ 20ppb

> 20ppb

< 0.5ppb

0.5 ～ 1ppb

1 ～ 10ppb

> 10ppb

909090 (>3.5ppb)

DMS

304580(3.5ppb)

H2S

304590

506090

707590

909090

SO2

Definition of Removal EfficiencyChemical FilterClassification

Species Conc. Level

Some relations between inlet concentration and removal efficiency are assumed as follows,


Example of Chemical Filter PerformanceExample of Chemical Filter Performance

10 100 1000time [days]

0

20

40

60

80

100

effic

ienc

y [%

]AVC-P-TS / H2S 3 ppbv

AVC-P-TS / H2S 50 ppbv

AVC-P-TS / SO2 0,5 ppbv

AVC-P-TS / SO2 20 ppbv

AVC-P-A / SO2 20 ppbv

AVC-P-A / SO2 0,5 ppbv

Efficiency curve for AVC-P filters for removal of SO2/H2SAir flow 2.500 m3/h, various TS upstream concentrations


Calculation AssumptionCalculation Assumption• Total OA flow rate：300,000CMH• Outside air conditions：

• FFU coverage：50%• FFU outlet velocity：0.35m/s

410150Abnormal peak-up (ppb)

0.10.55Normal situation (ppb)

DMSH2SSO2Item Species


Calculation Result (I)Calculation Result (I)無塵室內濃度 (ppb)

總合濃度DMSH2SSO2機台化學

濾網CR化學過濾網

2nd化學過濾網

1st化學過濾網

Air Washer

0.427680.060480.130030.23717突增狀況

0.174470.002210.019260.15299Class 1 Acid filter

Class 1 TS filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

一般狀況

5

1.412990.403190.357570.65222突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況


Class 2 Acid filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

4

5.84584.031930.953530.86035


Class 2 Acid filter

Class 2 Acid filter

Class 3 Acid filter

90%去除率

3

7.30674.03191.44471.8301


Class 2 Acid filter

無Class 2 Acid filter

90%去除率

2

7.59574.03191.73371.8301


Class 2 Acid filter


90%去除率

1

CleanroomOA處理項目

提案

• 無塵室FFU化學過濾網Coverage為100%。


Calculation Result (II)Calculation Result (II)

覆蓋率型式

75%

100%

50%

75%

100%

無塵室內濃度 (ppb)

總合濃度

DMSH2SSO2機台化學濾網

CR化學濾網2nd化學過濾網

1st化學過濾網

Air Washer

1.61950.40320.43070.7856突增狀況


Class 2 Acid filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

一般狀況

5

1.41300.40320.35760.6522突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況


Class 2 Acid filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

4

1.33340.23180.39010.7115


Class 1 TS

filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

3

0.88060.14620.26010.4743


Class 1 TS

filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

2

0.42770.06050.13000.2372


Class 1 TS

filter

Class 1 TS

filter

Class 3 Acid filter

90%去除率

1


提案


Calculation Result (III)Calculation Result (III)無塵室內濃度 (ppb)

總合濃度DMSH2SSO2機台化學

濾網CR化學過濾網

2nd化學過濾網

1st化學過濾網

Air Washer

2.239190.403190.650141.18586突增狀況


無Class 1

TS filter

Class 3 Acid filter

90%去除率

一般狀況

5

7.341424.031931.73371.57579突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況

突增狀況

一般狀況



Class 3 Acid filter

90%去除率

4

7.975574.031932.167121.77652



Class 3 Acid filter

90%去除率

3

14.96014.031934.334246.59396


無無Class 3 Acid filter

95%去除率

2

12.95294.031934.334244.5867


無無Class 3 Acid filter

90%去除率

1


提案


ConclusionsConclusions

AMCAMCAMCTotal SolutionTotal SolutionTotal SolutionEngineering

Site EvaluationSystem Plan / Design

Sampling & Monitoring Method Control Method / Installation

Yield / ProfitYield / Profitandand

Time to MarketTime to Market

Process ToolProcess Design / Process Layout

Product CharacteristicsProcess Chemical Usage

Enterprise

EnvironmentWeather Characteristics

ContaminantsContamination Dispersion

Air Flow Pattern

Threat / EffectThreat / Effect

Concept / IdeaConcept / Idea

ApplicationApplication

amc控制方法 與案例介紹 - l&k eng 1page.pdf · 2017-04-14 · confidential, unpublished...

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amc控制方法與案例介紹 - l&k eng 1page.pdf · 2017-04-14 · confidential, unpublished...