corresponding author: vladimirarozek @stuba.sk

1
Corresponding author: vladimir.tvarozek @stuba.sk Special thanks to Dr. I. Vavra for TEM Influence of spatial sputterig distribution on TCO thin film properties V. Tvarozek 1 , S. Flickyngerova 1 , I. Novotny 1 , A. Rehakova 1 , P. Sutta 2 , M. Netrvalova 2 , L. Prusakova 2 , P. Ballo 3 , E. Vavrinsky 1 1 Department of Microelectronics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia 2 Department New Technologies Research Center, The University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czech Republic 3 Department of Physics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia Introduction Doped ZnO is a promising transparent conducting oxide (TCO) and a wide band-gap semiconductor for application in thin film solar cells and various optoelectronic devices. ZnO thin films codoped by Al or Sc prepared by RF/DC magnetron sputtering are dependent on the deposition conditions [1]. It was also studied an effect of substrate position and content of oxygen on the properties of ZnO:Al films prepared by reactive co-sputtering from Zn and Al targets [2] or RF magnetron sputtering from ceramic ZnO + 2 wt.%Al 2 O 3 target [3]. Aim To accelerate our investigation of suitable thin film properties of ZnO:Al and ZnO:Sc, we exploit both (i) the RF diode sputtering where the bombardment of a growing film during deposition with energetic particles of various types (negative ions, reflected atoms, secondary electrons) has to be taken into consideration [4] and (ii) spatial distribution of sputtered particles given by configuration of substrates under the target. TEM characterization of samples ZnO:Al Plan view TEM micrograph of ZnO:Al thin films. The mean grain size is approx. 50 nm for middle sample (a) 20 nm for peripheral sample (b) Cross-sectional TEM micrograph (bright field image) of ZnO:Al thin film reveals the columnar structure Electron diffraction confirms the hexagonal ZnO:Al phase reveals the preferential orientation (001) in normal to the film plane direction. ED is taken at beam perpendicular to the film plane (b) (a) The different spatial distribution of structural/electrical/optical properties of ZnO:Al and ZnO:Sc thin films (more or less corresponding to deposition profiles) was observed. This effect is caused particularly spatial distributions of both fluxes, sputtered particles and energetic species (Ar ions neutralized at the target and reflected from it, negative oxygen ions coming from sputtered targets and secondary electrons) and their mutual ratios, which were responsible for both opposite effects on thin film properties: an improvement of composition (e.g. breaking-up oxide compounds of Al, Sc dopands and to replace Zn by them in the lattice) or the degradation of structure (e.g. to cause extended defects as intersticials, lattice expansion, grain boundaries). ZnO:Al films growing on the periphery of substrate holder showed smaller grains and crystallite sizes (regions of coherent x-ray scattering), high resistivity, very high compressive lattice stresses and a remarkable decrease of optical band-gap widths. Properties of ZnO:Sc films were not influenced considerable by different substrate position. They showed small sizes of crystallite, low comprehensive lattice stresses, relative high resistivity and transparency. Evolution of the electrical resistivity, biaxial lattice stress and crystallite size vs. sample position 6’’ ZnO:Al -80 -40 0 40 80 0 40 80 120 160 P o sitio n [m m] S ize o f crystallite [n m ] -6 -4 -2 0 B iaxiallattice stress [G Pa] 10 -2 10 -1 10 0 10 1 R esistivity [ cm ] -80 -40 0 40 80 0 40 80 120 160 S ize o f c ry s ta llite [n m ] B ia x ia lla ttic e s tre s s [G Pa] R e s is tiv ity [ cm ] P o sitio n [m m] -6 -4 -2 0 10 -2 10 -1 10 0 10 1 4’’ ZnO:Sc [1] T. Minami, T. Yamamoto, T. Miyata, Thin Solid Films 366 63 (2000) [2] Jing-Chie Lin, Kun-Cheng Peng, Hsueh-Lung Liao, Sheng-Long Lee, Thin Solid Films 516 5349 (2007) [3] F. Couzinie-Devy, N. Baaeau, J. Kessler, Thin Solid Films 516 7094 (2008) [4] V. Tvarozek, I. Novotny, P. Sutta, S. Flickyngerova, K. Schtereva, E. Vavrinsky, Thin Solid Films 515 8756 (2007) Conclusion Figure shows a cut in the plane (010) of 32 atom supercel. The purple spheres are Zinc atoms and the dark red spheres are Oxygen atoms. Aluminum atom migrates from initial position along dashed black arrow to the stable position where is situated between the two Oxygen atoms. The atom in the stable position is shown in blue. Figure shows a cut in the plane (010) for ZnO where an atom of Zinc (large magenta sphere) is alternated by Scandium (large blue sphere). Small red spheres mean oxygen. It is shown that despite equal ionic radius of Scandium and Zinc atoms, the first one forms larger atomic volume in the thin layer. This in fact could induce non zero magnetic moment which is experimentally observed. Modeling and simulations ZnO:Al ZnO:Sc Technology Corning glass substrates were placed on different positions under the target in diameter of 152.4 mm (ZnO + 2 wt.% Al 2 O 3 ) or 101.6 mm (ZnO + 2 wt.% Sc 2 O 3 ), distance of target-substrate holder was 40 mm. We have got the continual change of thin film thickness (so-called deposition profile) in one deposition run. Experimental data of normalized deposition profiles (to the maximal value in the center) fitted very well with computer simulations based on the Knudsen cosine law of the particle emission. -80 -60 -40 -20 0 20 40 60 80 2,90 2,95 3,00 3,05 3,10 O p ticalb an d -g ap [eV ] P o sitio n [m m] -80 -60 -40 -20 0 20 40 60 80 86 88 90 92 94 In teg raltran sm itta n c e [% ] P o sitio n [m m] -80 -60 -40 -20 0 20 40 60 80 2,90 2,95 3,00 3,05 3,10 O p ticalb an d -g ap [eV ] P o sitio n [m m] -80 -60 -40 -20 0 20 40 60 80 86 88 90 92 94 In teg raltran sm ittan ce [% ] P o sitio n [m m] 6” ZnO:Al 4” ZnO:Sc Optical properties 30 32 34 36 38 40 0 10 000 20 000 30 000 40 000 50 000 60 000 70 000 p erip h eralsam p le m id d le sam ple In ten sity (co u n ts) 2 [degrees] 200 400 600 800 1000 1200 0 20 40 60 80 100 Transm ittan ce [% ] W avelen g th [n m ] p erip h eral sam ple m id d le sam ple 4” ZnO:Sc Examples of XRD and optical spectra

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Influence of spatial sputterig distribution on TCO thin film properties. V. Tvarozek 1 , S. Flickyngerova 1 , I. Novotny 1 , A. Rehakova 1 , P. Sutta 2 , M. Netrvalova 2 , L. Prusakova 2 , P. Ballo 3 , E. Vavrinsky 1. - PowerPoint PPT Presentation

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Page 1: Corresponding author:  vladimirarozek @stuba.sk

Corresponding author: [email protected] thanks to Dr. I. Vavra for TEM analyses

Influence of spatial sputterig distribution on TCO thin film properties

V. Tvarozek1, S. Flickyngerova1, I. Novotny1, A. Rehakova1,P. Sutta2, M. Netrvalova2, L. Prusakova2, P. Ballo3, E. Vavrinsky1

1Department of Microelectronics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia2Department New Technologies Research Center, The University of West Bohemia, Univerzitni 8, 306 14 Plzen, Czech Republic 3Department of Physics, Slovak University of Technology, Ilkovicova 3, 812 19 Bratislava, Slovakia

Introduction Doped ZnO is a promising transparent conducting oxide (TCO) and a wide band-gap semiconductor for application in thin film solar cells and various optoelectronic devices. ZnO thin films codoped by Al or Sc prepared by RF/DC magnetron sputtering are dependent on the deposition conditions [1]. It was also studied an effect of substrate position and content of oxygen on the properties of ZnO:Al films prepared by reactive co-sputtering from Zn and Al targets [2] or RF magnetron sputtering from ceramic ZnO + 2 wt.%Al2O3 target [3].

Aim To accelerate our investigation of suitable thin film properties of ZnO:Al and ZnO:Sc, we exploit both (i) the RF diode sputtering where the bombardment of a growing film during deposition with energetic particles of various types (negative ions, reflected atoms, secondary electrons) has to be taken into consideration [4] and (ii) spatial distribution of sputtered particles given by configuration of substrates under the target.

TEM characterization of samples ZnO:Al

Plan view TEM micrograph of ZnO:Al thin films. The mean grain size is approx. 50 nm for middle sample (a) 20 nm for peripheral sample (b)

Cross-sectional TEM micrograph (bright field image) of ZnO:Al thin film reveals the columnar structure

Electron diffraction confirms the hexagonal ZnO:Al phase reveals the preferential orientation (001) in normal to the film plane direction. ED is taken at beam perpendicular to the film plane

(b)(a)

The different spatial distribution of structural/electrical/optical properties of ZnO:Al and ZnO:Sc thin films (more or less corresponding to deposition profiles) was observed. This effect is caused particularly spatial distributions of both fluxes, sputtered particles and energetic species (Ar ions neutralized at the target and reflected from it, negative oxygen ions coming from sputtered targets and secondary electrons) and their mutual ratios, which were responsible for both opposite effects on thin film properties: an improvement of composition (e.g. breaking-up oxide compounds of Al, Sc dopands and to replace Zn by them in the lattice) or the degradation of structure (e.g. to cause extended defects as intersticials, lattice expansion, grain boundaries).ZnO:Al films growing on the periphery of substrate holder showed smaller grains and crystallite sizes (regions of coherent x-ray scattering), high resistivity, very high compressive lattice stresses and a remarkable decrease of optical band-gap widths.Properties of ZnO:Sc films were not influenced considerable by different substrate position. They showed small sizes of crystallite, low comprehensive lattice stresses, relative high resistivity and transparency.

Evolution of the electrical resistivity, biaxial lattice stress and crystallite size vs. sample position

6’’ ZnO:Al

-80 -40 0 40 800

40

80

120

160

Position [mm]

Siz

e o

f cr

ysta

llite

[n

m]

-6

-4

-2

0

Bia

xial

latt

ice

stre

ss [

GP

a] 10-2

10-1

100

101

Res

isti

vity

[c

m]

-80 -40 0 40 800

40

80

120

160

Siz

e o

f cr

ysta

llite

[n

m]

Bia

xial

latt

ice

stre

ss [

GP

a]R

esis

tivi

ty [c

m]

Position [mm]

-6

-4

-2

010-2

10-1

100

101

4’’ ZnO:Sc

[1] T. Minami, T. Yamamoto, T. Miyata, Thin Solid Films 366 63 (2000)[2] Jing-Chie Lin, Kun-Cheng Peng, Hsueh-Lung Liao, Sheng-Long Lee, Thin Solid Films 516 5349 (2007)[3] F. Couzinie-Devy, N. Baaeau, J. Kessler, Thin Solid Films 516 7094 (2008)[4] V. Tvarozek, I. Novotny, P. Sutta, S. Flickyngerova, K. Schtereva, E. Vavrinsky, Thin Solid Films 515 8756 (2007)

Conclusion

Figure shows a cut in the plane (010) of 32 atom supercel. The purple spheres are Zinc atoms and the dark red spheres are Oxygen atoms. Aluminum atom migrates from initial position along dashed black arrow to the stable position where is situated between the two Oxygen atoms. The atom in the stable position is shown in blue.

Figure shows a cut in the plane (010) for ZnO where an atom of Zinc (large magenta sphere) is alternated by Scandium (large blue sphere). Small red spheres mean oxygen. It is shown that despite equal ionic radius of Scandium and Zinc atoms, the first one forms larger atomic volume in the thin layer. This in fact could induce non zero magnetic moment which is experimentally observed.

Modeling and simulations

ZnO:Al

ZnO:Sc

TechnologyCorning glass substrates were placed on different positions under the target in diameter of 152.4 mm (ZnO + 2 wt.% Al2O3) or 101.6 mm (ZnO + 2 wt.% Sc2O3), distance of target-substrate holder was 40 mm. We have got the continual change of thin film thickness (so-called deposition profile) in one deposition run. Experimental data of normalized deposition profiles (to the maximal value in the center) fitted very well with computer simulations based on the Knudsen cosine law of the particle emission.

-80 -60 -40 -20 0 20 40 60 802,90

2,95

3,00

3,05

3,10

Op

tica

l ban

d-g

ap [

eV]

Position [mm]-80 -60 -40 -20 0 20 40 60 80

86

88

90

92

94

In

teg

ral tr

an

sm

itta

nce [

%]

Position [mm]-80 -60 -40 -20 0 20 40 60 80

2,90

2,95

3,00

3,05

3,10

Op

tica

l ban

d-g

ap [

eV]

Position [mm]-80 -60 -40 -20 0 20 40 60 80

86

88

90

92

94

Inte

gra

l tra

nsm

itta

nce

[%

]

Position [mm]

6” ZnO:Al 4” ZnO:Sc

Optical properties

30 32 34 36 38 400

10 000

20 000

30 000

40 000

50 000

60 000

70 000

peripheral sample

middle sample

Inte

nsi

ty (

cou

nts

)

2 [degrees]

200 400 600 800 1000 12000

20

40

60

80

100

Tra

nsm

itta

nce

[%

]

Wavelength [nm]

peripheralsample

middle sample

4” ZnO:Sc

Examples of XRD and optical spectra