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Effect of Aluminum in Metallization Paste on the Electrical Losses in Bifacial N-type Crystalline Silicon Solar Cells
Takayuki Aoyama1, 2, Mari Aoki3, Isao Sumita3, Yasushi Yoshino1, Yoshio Ohshita3, Atsushi Ogura2
1Noritake Co., Limited 2Meiji University 3Toyota technological Institute
6th Metallization Workshop, Konstanz, Germany, 2016
Corresponding author: [email protected]
6th Metallization Workshop, Konstanz, Germany, 2016 /16
Motivation Evaluation method Test pastes Aluminum effects on n-type solar cells
Conclusion
- Problems in metallization with paste - In the case of Ag/Al metallization for n-type solar cells - Conventional evaluation for pastes
- Electrical losses … Voc, Rsh, J02
- Interface morphology between contact and Si wafer
- Homemade three test pastes
Outline
- “Floating contact method”
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
recombination shunting
emitter
…Loss in Voc ⇒ Severe limit of cell efficiency !
c-Si
glass
Ag Metallization with paste
・Ag ・glass frit
Significant effect
Problems in metallization with paste
Screen-printing with conductive paste -simple process and cheaper cost
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
Ag/Al paste
p+-emitter
n-Si large spike - Shunting ? - Recombination ?
? glass
Ag
Al
? Al
glass
Al
Problems in Ag/Al metallization
To elucidate the specific effects of Al The purpose of our study…
4
Ag/Al paste : Al addition ⇒ “Good” contact to p+-emitter
⇒ Complex composition
It’s still a big question how glass frit and aluminum affect ?
6th Metallization Workshop, Konstanz, Germany, 2016 /16
Conventional evaluation for pastes
How can we elucidate “specific” effects of Al ?
- Ag - Glass frit - Aluminum
Cell parameters
= Complex system
glass
Ag
Al
to evaluate respective effects of materials in paste
The conventional method cannot divide effects of glass frit and Al on cell parameters, accurately.
Changing paste composition…
Indirect method
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
Standard H-pattern grid-contact
emitter
detected
“Floating contact method”
R. Hoenig, Ph. D. dissertation, 2014.
Floating contacts electrically and geometrically isolated
from grid-contact
Floating contact “fraction”…
0% 5% 11% 16%
- Shunting - Carrier recombination
effects on an emitter
Advantages - Conductive ✓ - Nonconductive ✓ - Non-contact ✓ …Al less Ag past to p+-emitter
busbar
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
SiNx/SiO2
Floating contacts: Three test pastes H-pattern grid contact:
Ag/Al paste
Standard Ag paste
156mmx156mm n-type c-Si
Boron doped p+ emitter 70Ω/sq.
Phosphorus doped n+ BSF 40Ω/sq.
Ag
glass
Ag
glass
Ag
Al
Only-Ag
Ag/glass
Ag/glass/Al
Effect of glass frit
Effect of Al
Glass frit: PbO-SiO2-B2O3-ZnO
Test pastes - To elucidate specific effects of aluminum on p+-emitter
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
0 0.200 0.400 0.600
10.0
20.0
30.0
40.0
Cur
rent
den
sity
(mA
/cm
2 )
Voltage
Voc (V)
Jsc (mA/cm2)
FF (%)
Eff. (%)
0.641 37.84 77.62 18.77
Cell properties without floating contact
The cell parameters are good enough to evaluate the effects of floating contacts.
No floating contacts
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
0 5 10 15 20 250.628
0.632
0.636
0.640
0.644
Floating contact fraction (%)
Ope
n ci
rcui
t vol
tage
Voc
(V)
Same tendency
Open circuit voltage, Voc
Conductive paste causes loss in Voc in n-type solar cells even if the paste does not contain aluminum
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
Al mitigates generation of Ag-crystallites and their growth Adding Al causes forming the large spike
SiNx /SiO2
fewer shallower
Imprints of Ag-crystallites
Imprints of Ag/Al spike
p-Si mirror
contact
Interface morphology underneath contact HNO3/HCl HF HNO3/HCl
Shunting? , Recombination? Shunting? 1µm
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
0 0.200 0.400 0.60010-7
10-6
10-5
10-4
10-3
10-2
10-1
100
101
102
Voltage (V)
Cur
rent
den
sity
(mA
/cm
2 )
Al mitigates the current increase at low voltage range. Numerical fitting with the two-diode model ⇒ Rsh, J02
Dark IV curves
Fraction:16%
hump
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6th Metallization Workshop, Konstanz, Germany, 2016 /16
0 5 10 15 20 25103
104
105
106
107
Floating contact fraction (%)
Shu
nt re
sist
ance
Rsh
(Ωcm
2 )
Al in Ag/Al paste does not induce significant shunting
Shunt resistance, Rsh
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mitigated
6th Metallization Workshop, Konstanz, Germany, 2016 /16
0 5 10 15 20 250
1.0
2.0
3.0
4.0
5.0
6.0
Floating contact fraction (%)
Rec
ombi
natio
n cu
rrent
den
sity
J 02 (
10-9
A/c
m2 )
Al mitigates the increase of recombination current
Recombination current, J02
13
mitigated
6th Metallization Workshop, Konstanz, Germany, 2016 /16
Al effects on p+-emitter
Al glass
Ag-crystallite fewer
shallower
Rsh, J02
mitigated
Rsh, J02
degraded
The Al effects on Ag-crystallite mitigates the decrease of Rsh and the increase of J02 The large spikes do not induce the significant electrical losses
14
2.0µm
6th Metallization Workshop, Konstanz, Germany, 2016 /16
Conclusion
Conductive paste causes loss in Voc in n-type solar cells even if the paste does not contain Al
Al in Ag/Al paste mitigates shunting of pn junction and carrier recombination on p+-emitter by mitigating generation of Ag-crystallite and their growth
The big metallic spikes underneath Ag/Al paste do not induce significant shunting of pn junction and carrier recombination
“Specific” effects of Al on p+-emitter can be elucidated by using the “floating contact method”
with the homemade test pastes.
The “floating contact method” have big advantages for elucidating respective effects of paste component on cell parameters.
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6th Metallization Workshop, Konstanz, Germany, 2016
“Effect of Glass Frit in Metallization Paste on the Electrical Losses in Bifacial N-type Crystalline Silicon Solar Cells” Takayuki Aoyama, Mari Aoki, Isao Sumita, Yasushi Yoshino, Yoshio Ohshita, Atsushi Ogura “A Study on the Evaluation Method of Glass Frit Paste for Crystalline Silicon Solar Cells” Mari Aoki, Takayuki Aoyama, Isao Sumita, Yasushi Yoshino, Atsushi Ogura, Yoshio Ohshita
Thank you for your attention!