investigation of the structural resistance of silicon membranes for microfluidic applications in...
TRANSCRIPT
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Investigation of the structural resistance of Silicon membranes
for microfluidic applications in High
Energy PhysicsC. Gabry
A. Mapelli, G. Romagnoli, D. Alvarez, P. Renaud,
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Summary1 – Objectives of the project
2 – Literature review
3 – Single-Edge V-Notch Beam (SEVNB) tests 3.1 – SEVNB specimens 3.2 – Experiments 3.3 – Results 3.4 – Discussion
4 – Channel geometry beam specimens under bending stress 4.1 – Specimens 4.2 – Experiments 4.3 – Results 4.4 – Discussion
5 – Conclusion
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ContextAim : reduce material budget of SCSi micro-
devices
Minimize of thickness of SCSi membranes
Insure sufficient resistance to internal pressures=> Need of fracture prediction tool to optimize
structures
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1 – Objectives
Main goal : provide fracture data for the implementation of a fracture prediction tool
Requirements : simple situation to allow CERN’s Engineering Office to make reliable models
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1 – Objectives2 testing rounds :
Fracture toughness test => to set parameters of FEA model
Test with slightly more complex geometry to validate those parameters
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2 – Literature review
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Fracture ToughnessDefinition : Fracture toughness (Kc) is the ability
of a material to resist against propagation of a pre-existing crack.
Fracture toughness = critical stress intensity
Unit : Pa√m
High fracture toughness : Ductile fracture
Low fracture toughness : Brittle fracture
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Fracture modes3 different fracture modes :
tensile (mode I), -typically the weakest- shear (mode II), tear (mode III)
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Fracture toughness testTo perform a fracture toughness determination
test, one need :
Sample with pre-existing crack of known geometry
Tool able to apply and measure load & displacement
The load at fracture to allow for fracture toughness calculation
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3 – Single-Edge V-Notched Beam (SEVNB) in three point bending
tests
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3.1 – SEVNB Specimens
Easy to manufactureExisting standards
(ASTM C1421-10 for ex.)Possible to perform FEAEasy to testNo tensile stress (except at crack tip)
Reasons of the choice
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3.1 – SEVNB Specimens
1st step : Alignment to crystalline structure
2nd step : Photolithography
3rd step : Notch etching (KOH)
4th step : Dicing
Fabrication process
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3.1 – SEVNB Specimens
Mask for SEVNB specimens fabrication
Fabrication process
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3.1 – SEVNB SpecimensObtained specimens
Obtained notches :
Picture of full specimen ?
Mask ?
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3.1 – SEVNB SpecimensDimensions of specimens
Standard sizes are too large (e.g. W=3mm)
ASTM standards gives two main ratios to respect :W/B = 0.75 0.35 < a/W < 0.6 Fabricated specimens :
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3.1 – SEVNB SpecimensAnalytical formula for fracture toughness
FEA Comparison between Sharp and V-Shaped crack
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3.1 – SEVNB SpecimensAnalytical formula for fracture toughness
Comparison between various analytical formulas for fracture toughness
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3.2 – SEVNB ExperimentsExperimental setup – Overview
1 actuator
1 load cell
Mechanical support to link & align parts
Removable chuck to adapt to every test
Transportable & adaptable system
Taken from “In-situ MEMS Testing”, A. Schifferle, A. Dommann, A. Neels and E. Mazza
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3.2 – SEVNB ExperimentsExperimental setup – Chucks
Vertical pins (1mm spacing)
Available chucks :S0=5mm
S0=10mm
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3.2 – SEVNB ExperimentsCompliance calibration
Extremely stiff sample (1mm diameter steel rod) in place of specimen
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3.2 – SEVNB ExperimentsData analysis
Initial slack correction by linear fit
Tool compliance correction on measured deformation
δb : Deformation of the beam P : Load δt (=P*Ct) : Deformation of the toolδm : Measured deformation Ct : Compliance of the tool,
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3.3 – SEVNB ResultsCompliance
Analytical compliance : 1.55*10-6 m.N-1
Mean experimental compliance : 1.27*10-6
± 0.39*10-6 m.N-1
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3.3 – SEVNB ResultsFracture Load
Fracture toughness from literature (for (110) plane)* :1.23±0.18 MPa.√m-1
Experimental fracture toughness : 1.50±0.09 MPa.√m-1
*T. Ando, X. Li, S. Nakao, T. Kasai, M. Shikida and K. Sato, “Effect of crystal orientation on fracture strength and fracture toughness of single crystal silicon”, Micro Electro Mechanical Systems, 17th IEEE International Conference on MEMS, pp. 177-180 (2004)
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3.3 – SEVNB ResultsScatter in results
No correlation between fracture load and compliance
Higher scatter for compliance than fracture toughness
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3.4 – Sources of scatterSharpness of notch
Notch sharpness :
22.89nm radius for this measurement
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3.4 – Sources of scatterDepth of notch (a)
Notch depth conform to what was planned
(143um for the measured sample, 2um bigger than expected)
Make more measurements to see standard deviation
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3.4 – Sources of scatterMisalignment of sample
500um misalignment=> 5.8% compliance variation
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3.4 – Sources of scatterThickness of sample (B)
10um variation of B=> 1.1% variation of compliance
B fixed by dicing=> low variability expected
Actual measurements of B with standard deviation !!
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3.4 – Sources of scatterMisalignment of tool
Multiple types of possible misalignments
(In plane, out of plane…)
Not possible to estimate without changing boundary conditions of FEA model
Source of global error ? (same misalignment for a batch)
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3.4 – Sources of scatterCompliance of tool too high
Tool compliance higher than sample compliance… Not ideal !
But in theory possible to correct
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3.4 – Sources of scatterConclusion
Most sources did not have a big enough impact to explain all the scatter
Misalignment inside the tool was not estimated, but is probably the main source of mismatch (not scatter)
Brittle materials typically have a random behaviour
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4 – Channel geometry beam under bending
stress
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4.1 – Introduction & goals
Sample with channel-like notch
Goals :1 – validate simulation
parameters establishedduring SEVNB tests
2 – study influence of manufacturing method on overall strength of sample
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4.2 – Specimens
1st step : Alignment to crystalline structure
2nd step : Photolithography
3rd step : Notch etching (KOH or DRIE)
4th step : Dicing
Fabrication process
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4.2 – SpecimensObtained specimens
4 types of specimen :
DRIE90° KOH
DRIE80° DRIE60°
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4.2 – SpecimensDimensions of specimens
Optical measurements performed on 5 samples for each type
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4.3 – ExperimentsExperimental process
3 point bending :
Chuck just under channel
Precise alignment
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4.3 – ExperimentsExperimental process
Tests both in three– and four point bending
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4.4 – Results3 point bending
DRIE 60° DRIE80°
DRIE 90° KOH
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4.4 – Results4 point bending
DRIE 60° DRIE80°
DRIE 90° KOH
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4.4 – ResultsFracture loads
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4.4 – ResultsCompliance
Much higher mismatch for 3 point bending than for 4 !
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4.4 – ResultsCompliance – Summary
Much higher mismatch for 3 point bending than for 4 !
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4.4 – Parametric analysis
FEA estimation of influence of notch depth on compliance
Estimation of measurement errors through FEA model
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4.4 – Parametric analysis
Measurement errors have more impact for 3 point bending tests than for 4 point ones
Estimation of measurement errors through FEA model
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5 – ConclusionGathering of fracture data with SEVNB specimens to
allow setting parameters of fracture prediction tool
Validation of parameters through second testing batch
Essays on tensile-test machine for micro-scale specimens
Observation of sensitive aspects in fracture tests (scatter sources)
Observation of impact of manufacturing methods on fracture strength
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Backup slides
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Energy based approach
Elastic energy released = surface energy created
Energy release rate (G = πσ2a/E) : speed at which the energy is released by growth of the crack
GIc= KIc2*(1-ν2)/E[hkl]
(E : Young’s modulus, a : half crack length, σ : stress ; ν : Poisson’s coefficient ; [hkl] : Miller indexes)
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Possible test methodsA – Micro-indentation
B – Double Cantilever Beam
C – Compact Tests
D – Compression Loaded Double Cantilever Beam
E – Three/four point bending
F – Other (cantilever bending, On-chip tensile test device)
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A – Micro-indentationEasy to implement
Possible to test several crystalline orientations
Machinery quite common
Measuring the crack length
Residual stress after indentation
Hard to simulate with FEA
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B – Double Cantilever Beam
Theoretically possible to measure propagation values
Plastic deformation in arms
Direction of crack growth
Tensile load applied
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C – Compact TestsLess plastic deformation in thick arms
Short arms => crack growth direction more controllable
Plastic deformation & parasitic crack growth at load pins
Only initiation
Tensile load applied
D – Compression-Loaded Double Cantilever Beam
No tensile stress applied
Side groove to help crack grow in the intended direction
Stable crack growth
Crack growth monitored with thin film resistance
Wrong direction of crack growth
Hard to test such specimens (need a frame to hold them)
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E – Three/four point bending of notched
specimenASTM standard procedures available
Test under bending conditions
Easy modeling and manufacturing
Standard not adapted to our needs (scale)
No propagation measurements
F – Other
On chip tensile test device :
Complicated analysis
Sharpness of notch
Complicated fabrication process
Easy to apply the load
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Wet etching for vertical sidewalls
45° orientation of specimens relative to primary flat can lead to vertical sidewalls with KOH etch
%wt of KOH and temperature have an influence on the obtained slope of the walls
Ex : 60%wt & 60°C
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Alignment to crystalline planes
Anisotropic KOH etching step results in squares under the circle openings
Squares which are the most alligned give the cristalline orientation
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Support of the beams
Beam should be free to rotate around the rollers
Diameter : 0.5 – 1 mm
Supports considered :Razor bladesSteel wires
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3 points bendingmanufactured wafer
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3.2 – Compression Loaded Double
Cantilever Beam
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Reasons of the choiceCL-DCB has been chosen
as second specimen :
Easy to manufacture Possible to perform
FEA No tensile stress
(except at crack tip) Eventually possible to
measure both initiation & propagation values
Stable crack growth Easy to monitor crack growth (metal
gage)
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Dimensions of specimensb defined by wafer
thickness
Other dimensions set to keep ratios of previous experiments with this specimen
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Fabrication process
1st step : Alignment to crystalline structure
2nd step : DRIE with specimen shape
3rd step : Smoothing (RCA cleaning, SiO2 oxidation, etching of SiO2 layer)
4th step : Releasing of specimens by grinding of back side
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Required machinery
Possible to estimate fracture load P and displacement by assuming KIc = 1Pa√m
For B=1mm, W=525μm, L=10mm, a=300μm : Fc = 450 mN
yc = 23 μm
=>Resolution required : ≈ 10mN & 1μm
(Tensile test machine at CERN has 8mN and 1μm resolution)
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Tools available