seminario paroni 6-9-12 - unipi.it · seminario paroni 6-9-12 author: riccardo barsotti created...
TRANSCRIPT
Surface micromachining
(111) oriented silicon monocrystal
Si3 N4 deposition by CVD
Si3 O2 deposition by CVD
Deposition of photoresistant polymer
Selective etching of Si3 O2
Removal of Si3 N4 and photoresistant polymer
Removal of Si3 O2
Deformation
EXTINT εεε +=0Ø Temperature induced deformation:
( ) TNSiSiEXT Δ−=43
ααε
Ø Deformation due to lattice mismatch :
43
43)(
NSi
NSiSiINT a
aa −=ε
Sia
43NSia
Applications
Collimator Undulator