zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢...

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prepared by sol-gel spin coating 指指指指 指指指 指指指 指指指指2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department of Applied Chemistry, School of Engineering, Tokai University, 1117, Kitakaname, Hiratsuka, Kanagawa, 259-1292, Japan.

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Page 1: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

Zinc oxide films prepared

by sol-gel spin coating

指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15

Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30.Department of Applied Chemistry, School of Engineering, Tokai University, 1117, Kitakaname, Hiratsuka, Kanagawa, 259-1292, Japan.

Page 2: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

大綱前言實驗流程結果與討論結論

Page 3: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

前言 ZnO films are n-type wide-gap semiconductors with optical

transparency in the visible range. Zinc oxide films deposited by chemical spray pyrolysis had

resistivities (~10-3 Ωcm). Al-doped ZnO films formed by sol-gel dip coating gave

resistivities of (7-10) × 10-4 Ωcm. No reports are found on zinc oxide films prepared by sol-gel

spin-coating that can be made with a simple coating apparatus.

Page 4: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

實驗流程

Page 5: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

結果與討論

The (002) peak intensity increased with an increase in the annealing temperature. However, the full width at half-max-ima (FWHM) of the (002) peaks was hardly changed with increasing film annealing temperature. Hence, the multiple-coating or piling up of each ZnO film was considered not to disturb the overall growth of the films with c-axis orientation.

Page 6: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

We confirmed that this shoulder peak was thought to be due to metallic zinc present, as interstitial atoms, in the lattice of ZnO crystallites in the film, rather than reduced Zn by Ar+ sputter-etching, because the shoulder peak existed from the outermost surface.

Page 7: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

However, the resistivity increased mildly because the decrease of the carrier concentration might be controlled because of decreasing defects that produce donor levels, as a result, decomposition and oxidation of the precursor films became more active, and a better stoichiometry of the ZnO films was formed above 525 , ℃rather than the change of the mobility with the annealing temperature.

Page 8: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

where Ea1 is the activation energy for band conduction as defined in Eq. 3., Ea2 , the activation energy for nearest neighbor hopping conduction, k, the Boltzmann constant and σ1 and σ2, the pre-exponential factors,espectively.

Page 9: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department
Page 10: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department
Page 11: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department
Page 12: Zinc oxide films prepared by sol-gel spin coating 指導老師:林克默 學 生:吳仕賢 報告日期: 2010.01.15 Y. Natsume, H. Sakata, Thin Solid Films 372 (2000) 30. Department

結論 The160-230nm thick films formed on Pyrex glass substrate were

polycrystalline with c-axis orientation. A minimum d.c. resistivity of 28.2 Ωcm was obtained by a 10-

cycle spin-coating of zinc acetate film followed by annealing in air at a temperature of 525 .℃

Grain boundary scattering was caused by thermionic emission of electrons over grain boundaries.

The optical band gap energy was obtained to be Eopt =3.2-3.21 ev for the films.