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Page 1: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 1

ASML Introduces theNew Generation TWINSCAN�the XT:1250

Page 2: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 2

The TWINSCAN XT:1250

� A 193-nm volume production tool for the 65-nm node� Aimed at the 200-mm and 300-mm markets� Ultra-k1 solutions portfolio as standard� A modular configuration

Page 3: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 3

Enhanced dual-stage performance� Improved imaging provides higher performance

0123456789

101112131415

130 115 100 90 80 70 65Design Rule

CD

U-3

sig

(nm

)

Exposure System CDU Requirement : ~7.5% of Design Rule

Single stage

XT:1250

Page 4: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 4

Enhanced dual-stage performance� Dual stages provide overlay advantage for higher

yield�more good die per wafer

Single stage AA

Single stage AB

68

1012141618202224262830323436

130 115 100 90 80 70 65Design Rule

Ove

rlay

(nm

)

XT:1250 AA

XT:1250 AB

Exposure System Overlay Requirement : ~25% of Design Rule

Page 5: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 5

Enhanced dual-stage performance� Dual stages provide an average of 22% greater

throughput across a range of die sizes

607080

90100110120

130140150

5x5

6x6

7x7

8x8

9x9

10x

10

11x11

12x

12

13x13

14x

14

15x15

16x

16

17x

17

18x

18

19x

19

20x

20

21x21

22x

22

23x

23

24x24

25x25

26x26

Die Size (mm)

XT:1250

300

mm

Thr

ough

put (

WPH

)

Single Stage

Page 6: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 6

ASML ArF roadmap 200 and 300 mm150 nm

130 nm

100 nm

90 nm

70 nm

1999 2000 2001 2002 2003 2004 2005

PAS 5500/1100NA=0.75

PAS 5500/950BNA=0.63

Very high NA & low k1 advances on compact TWINSCANTM platform

80 nm

Innovations for ArF lithography

Improvements for130-nm production

High NA for 100-nm production

Improvements for 90-nm production

/1100B0.75

AT:1100BNA=0.75

AT:1150C0.75

/1150C0.75

AT:1200BNA=0.85

XT:1250NA=0.85

PAS 5500TM

/900 NA=0.6

Very high NA for 80-nm production

Res

olut

ion

(nm

)

Page 7: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 7

Ultra-k1 products as a standard feature

� Addresses challenges in manufacturing with low k1

0.25

0.35

0.45

0.50

0.65

0.75

0.85

0.95

1000 500 350 250 150 90 45

K1

Val u

eG-line

I-line

KrFArF

F2

Resolution (nm)

Page 8: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 8

Ultra-k1 products

� Standard on the XT:1250� Mask design optimization

� Aberration measurement and control

� Process variability compensation

� Optional� Customized illumination

Page 9: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 9

XT:1250 imaging results: dense lines*

70 nm (BIM)

+0.05 �m0.00-0.05 �m +0.10 �m-0.10 �m-0.15 �m +0.15 �m140-nm pitch through focus. Binary mask. 70-nm lines: dipole NA=0.85, sigma 0.93/0.69.TArF6111, Ft=175 nm on Arc28

65 nm (AttPSM)Design on mask: 65-nm 1:1 pitch6% AttPSMDipole 35X illumination settingNA=0.85, sigma 0.93/0.69TArF6111, Ft=175 nm on Arc28

*Data acquired using an AT:1200B

Page 10: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 10

XT:1250 imaging results: dense contact holes*85 nm (AttPSM)

170-nm pitch6% AttPSMNA=0.85, sigma 0.93/0.69 QUASARTM-30Process: 250-nm TArF 7047, 82-nm AR19

-0.2µm +0.2µmnominal

80 nm (CPL**)

160-nm pitch1:1 contacts

75 nm (CPL)

150-nm pitch1:1 contacts

65 nm (CPL)

130-nm pitch1:2 contacts

**Reticle CPL� technology from ASML MaskTools*Data acquired using an AT:1200B

Page 11: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 11

A modular response to customer requirements

XT:1250 - a modular configuration

25% reduction in footprint 4.5 m

2.02 m

2.89 m1.2 m

2.0 m

0.6 m

Page 12: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 12

108 TWINSCANS INSTALLED Sep 03

XT built on established TWINSCAN platform - TWINSCAN installed base

12124646

5050

Page 13: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 13

Fab requirement specifications lowered

� Up to 50% reduction in facility requirements

� Process cooling water

� Clean dry air

� Exhaust heat load

� etc.

Page 14: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 14

The XT:1250: customer ordersShipping in Q2 2004

Page 15: ASML Introduces the New Generation TWINSCANŽ the … · ASML ArF roadmap 200 and 300 mm 150 nm 130 nm 100 nm ... 1000 500 350 250 150 90 45 K 1 V al u e G-line I-line KrF ... sigma

/ Slide 15

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