zone plate microscopy - university of california, berkeleyattwood/srms/2007/lec22.pdf ·...
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Zone Plate Microscopy
David Attwood
University of California, Berkeley
(http://www.coe.berkeley.edu/AST/srms)
Zone Plate Microscopy and Applications, EE290F, 12 April 2007
∆r
λ
θf
f +
D = 2rN
rn
r2r1 nλ
2
Zone Plate lens
Sample
Soft X-ray CCD
λ
Zone Plate Lens
Soft X-Ray Microscope
Zone Plate Formulae
r2 = nλf +
λ = 2.5 nm,∆r = 25 nmN = 618
0.63 mm
0.05 µm
1 µm
1/700
1.22∆r = 30 nm
0.8∆r = 19 nm
63 µmD = 4N∆r
NA =
f =
nn2λ2
4
4N(∆r)2
λ
λ2∆r
≤1N
∆λλ
Res. = k1 = 2k1∆rλ
NA
DOF = ± λ
(NA)212
(9.9)
(9.13)
(9.14)
(9.15)
(9.50)
(9.52)
k1 = 0.61(σ = 0)
k1 = 0.4(σ = 0.45)
Ch09_F00modif_Oct04.ai
Zone Plates for Soft X-Ray Image Formation
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F21modif_Nov05.ai
Two Common Soft X-Ray Microscopes
Aperture(OSA)
Detector
Samplescanning
stage
Zone Plate lens
Sample
Soft X-ray CCD
λ
λ
Full-FieldMicroscope
ScanningMicroscope
• Best spatial resolution• Modest spectral resolution• Shortest exposure time• Bending magnet radiation• Higher radiation dose• Flexible sample environment (wet, cryo, labeled magnetic fields, electric fields, cement, ...)
• Least radiation dose• Next best spatial resolution• Best spectral resolution• Requires spatially coherent radiation• Long exposure time• Flexible sample environment• Photoemission (restricted magnetic fields), fluorescence imaging
Zone Plate lens
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F01VG.ai
A Fresnel Zone Plate Lensfor X-Ray Microscopy
E. Anderson, LBNL
Zone Plate Microscopy and Applications, EE290F, 12 April 2007Professor David AttwoodUniv. California, Berkeley
Ch09_F03VGrevApril04.ai
Diffraction from a Transmission Grating
d
d
(+1)
(–1)
(0)
θθ
λ
λ
θ
;
(50% absorbed)
(9.2)
(9.24)
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F05VG.ai
A Fresnel Zone Plate Lens
∆r
λ
θf
f +
f2 + r2 = f + 2
D = 2rN
rn
r2r1
nλ2
nλ2n
nr2 = nλf + n2λ2
4
(9.9)
(9.10)
(9.8)
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch9_F05_Nov05.ai
A Fresnel Zone Plate Lens
(9.13)
(9.14)
Define the outer zone width for n → N,
(9.15)
=
and from (9.12) above
D2f
(9.16)
(9.11)
(9.12)
(from 9.10)but λ f =
∴
∆r
λ
θf
f +
D = 2rN
rn
r2r1
nλ2
2
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F02_modif_VG.ai
A Fresnel Zone Plate Lens Used as aDiffractive Lens for Point to Point Imaging
∆r
D
S
P
p
pn
q
qn
(9.17)
(9.18)
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Zone Plate Diffractive Focusing for Higher Orders
ZP
(–5)(–3)
(m = –1)
(m = –5) (–3)
(–1)OSA
λ f5
5nλ2
+
f3
3nλ2
+
nλ2
f +
f
f5 f
3
(9.19)
(9.24)
1m
rN2
Nλfm =
1mfm = f1
Ch09_F08_Nov05.aiProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F11VG.ai
Diffraction from a Fresnel Zone Plate
(9.45)
(9.46)
λ
ξ
θ
D
y
P(x,y)
R
z
xr
η
ρ2 = ξ2 + η2∆r
S(ξ,η)
00 5 10
kaθ
N2
N2
N2
2
kaθ = 3.832
Foc
al p
lane
inte
nsity
, I(θ
)/I o
2J1(kaθ)
(kaθ)
2
Airy pattern
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F14_April04.ai
Resolving Two Point Sources
r
ΙRayleigh
(b)(a)
rnull = 0.61λ/NArnull = 0.61λ/NA rnull
∆∆
• Point sources are spatially coherent• Mutually incoherent• Intensities add• Rayleigh criterion (26.5% dip)
Conclusion: With spatially coherent illumination, objects are “just resolvable” when
Res|coh = = 1.22 ∆r0.61 λ
NA
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Opaquezones
Coherent illumination(σ = 0)
Spatialresolution:
1.2 ∆r
∆r
λx
Fresnel Zone Plate Lens for Diffractive Focusing of Spatially Coherent X-rays
Ch09_FresnelZP_Apr07.ai
Rescoh =
NA =
∴ Rescoh = 1.22 ∆r
(σ = 0, see first slide)
0.61 λNAλ
2∆r
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F19_Nov05.ai
Partially Coherent Illumination Permits ImprovedSpatial Resolution by a Factor Approaching Two
d2
2πd
2π(d/2)
d2
d
(a)
(b)
(c)
ks
ks
ks
ki
ki
ki
ki
θ
2θ
θ
2θ
σ = (for n = 1)NAillum.NAobj.
sinθillum.sinθobj.
θobj.
θillum.
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F10.2_Nov05.ai
Optical Transfer Properties with VaryingDegrees of Partially Coherent Illumination
0 1 2
0.5
1.0
App
aren
t tra
nsfe
r fu
nctio
n
Spatial frequency (NA/λ)
σ = ∞ (incoherent)
σ = 0.6
σ = 0.3
σ = 0 (coherent)
σ = (for n = 1)NAillum.NAobj.
sinθillum.sinθobj.
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_10.3.ai
Intensity Versus Position for a Sharp Edge ObservedWith Coherent and Partially Coherent Radiation
–2 –1 0(edge)
1
Distance (λ/2NA)
Inte
nsity
2 3
σ = ∞σ = 1.5σ = 1.0σ = 0.9σ = 0.8σ = 0.6σ = 0.2
1.3
1.0
0.5
0
Courtesy of M. O’Toole and A. Neureuther (UC Berkeley).Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_F18_Nov05.ai
Depth of Focus and Spectral Bandwidth
(9.50)
(9.51)
(9.52)∆r
λ
z = f
z
focal plane, z = f
two depths of focus away, z = f –
four depths of focus away, z = f –
λ2(NA)2
λ(NA)2
2λ(NA)2
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_WhyDOFscale.ai
Why does DOF Scale as /NA2?
High NA
Low NA
θ
λ
0.6λ/NADOF/2
DOF/2
tanθ =
tanθ ~ sinθ = NA
∴ DOF
DOF = ±
for small θ
in the text, eq. 9.50:
0.6λNA
0.6λNA
1.2λ/NAtanθDOF =
DOF
1.2λNA2
12
λ(NA)2
θ
θλ
DOF
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_TestPattrn.ai
Test Pattern for NanometerSoft X-ray Imaging
E. Anderson, D. Olynick, B. Harteneck, E. Veklerov, LBNL
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
The XM-1 Soft X-Ray Microscopeat the Advanced Light Source (ALS)
E = 250 - 1.8 keVλ = 0.7 nm - 5 nm
• High spatial resolution (20 nm)• Modest spectral resolution (E/ΔE ~700)• Thick, hydrated samples (10 µm)• Short exposure time (~1 second)• Well engineered, pre-focused• Mutually indexed visible and x-ray microscopes• High throughput (hundreds of samples per day)• Large image fields by tiling• Easy access, user friendly• Cryotomography
13
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
High Resolution Zone-Plate Microscope XM-1at the ALS
• Well engineered• Sample indexing• Tiling for larger field
of view• Pre-focused• High sample throughput• Illumination important• Phase contrast
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Bending Magnet Photon Flux at the ALS
Professor David AttwoodAST 210/EECS 213Univ. California, Berkeley
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Micro Zone PlatesΔr = 25 nm (15 nm), Δt = 70 nm (5%) (170 nm). N = 618, D = 63 µm, f = 650 µm, NA = 0.05 at 2.4 nm. Δr = 35 nm, Δt = 85 nm (8%).Condenser Zone PlateΔr = 55 nm (40 nm), Δt = 200 nm (22%). N = 41,000, D = 9 mm, f = 207 mm,NA = 0.022 @ 2.4 nm. σ = 0.45 with Δr = 25 nm micro zone plate.
MagnificationM = 2400 to 3100; 24 µm CCD pixel 8 nm at sample.Spectral Bandpassλ/Δλ = 700, per pixel, 2 µmD field.λ/Δλ = 500 with shaker, 10 µmD field.CCD CameraBack thinned, soft x-ray sensitive. 1024 x 1024 (2048 x 2048), 24 µm square pixels. 60 -70% efficient.Exposure Time1-5 seconds, 103 photons/pixel, 8 µm diameter at sample (2.5 sec @ 400 mA, 2 x 2 binning,Δr = 25 nm)
XM-1 Parameters
ZP microscopy Apps1.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
New Overlay Nanofabrication Techniquefor Narrower Outer Zones
Δr = 15 nmΔt = 90 nmOverlay ~ 2 nm accuracy–
Courtesy of J.A. Liddle, E.H. Anderson, B. Harteneck and W. Chao, LBNL
ZP microscopy Apps1.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Multilayer Mirror Coatings Can Be Thinnedand Used As Sub-20 nm Test Patterns
High quality test patterns can be fabricatedwith sections as thin as 5 nm.
SEM Micrographof Cr/Si test pattern
ΔtCourtesy of W. Chao, UC Berkeley and CXRO/LBNL.
ZP microscopy Apps1.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Near Diffraction Limited Soft X-Ray Microscopy:20 nm Spatial Resolution at 2.07 nm Wavelength
15 nm linesnot resolved,no modulation
(barely “resolved”)
W. Chao et al.,Opt. Lett. 28, 2019 (Nov 2003)
ZP microscopy Apps1.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
New Results Using Overlay Nanofabrication:Outer Zone Width of 15 nm
• Zone plate lenses made using a new, e-beam based nanofabrication techniquehave extended outer zones from 25 nm to 15 nm.
• The new lenses work as expected, resolving fine patterns not seen previously• Shorter depth of focus (λ/NA2) opens the opportunity for soft x-ray “optical
sectioning” of biological material.
15 20 25 30 35 40 45 50 550.0
0.2
0.4
0.6
0.8
1.0
15
1/period (um-1)
half-period (nm) 25 20 12.5 10
Norm
aliz
ed Im
age M
odula
tion
!rMZP
=25nm
" =0.21 to 0.42
Calculated Measured
!rMZP
=15nm
" =0.19 to 0.38
Calculated Measured
100 nm
Soft x-ray image of15 nm Cr/Si lines & spaces
W. Chao, B. Harteneck, J.A. Liddle, E. Anderson and D. Attwood “Soft X-Ray Microscopy at a Spatial Resolution Better than 15 nm”, Nature 435, 1210 (30 June 2005).
New zone plate lens with15 nm outer zone width
Zone Plate Parameters for ∆r = 15 nm,λ = 2.5 nm and λ = 1.5 nm
λ = 2.5 nm 1.5 nm∆r = 15 nmN = 500D = 30 µmf = 180 µm 300 µmNA = 0.083 0.05 18 nm (σ = 0) 12 nm (σ = 0.4)DOF = ± 180 nm ±300 nm∆λ/λ = 1/500
Res =
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Fe L3 @ 707.5 eV
1 µm Nucleus
Cell border
NucleoliNucleoli
Cellborder
Cryo X-Ray Microscopyof 3T3 Fibroblast Cells
100 nmlines &spaces
Protein LabeledMicrotubule Network
FeTbCo Multilayerwith Al Capping Layer
Magnetic RecordingMaterials
Cryo Microscopy for the LifeSciences
Courtesy of P. Fischer (Max Planck)and G. Denbeaux (CXRO/LBNL)
Courtesy of C. Larabell (UCSF)and W. Meyer-Ilse (CXRO/LBNL)
Applications of Soft X-Ray Microscopy
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
The Water Window forBiological X-Ray Microscopy
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Helium passes through LN, is cooled,and directed onto sample windows
W. Meyer-Ilse, G. Denbeaux, L. Johnson, A. Pearson (CXRO-LBNL)
-150
-100
-50
0
50
-10 0 10 20 30 40 50 60 70 80 90 100
Time (milliseconds)
Tem
pera
ture
(Cel
sius
)50°c
16 msΔTΔt
= –
Fast Freeze
Fast Freeze Cryo Fixation Strongly MitigatesRadiation Dose Effects
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Cell border
Nucleus
NucleoliNucleus
Cell border
Nucleoli
Cell border
C. Larabell, D. Yager, D. Hamamoto, M. Bissell, T. Shin (LBNL Life Sciences Division)W. Meyer-Ilse, G. Denbeaux, L. Johnson, A. Pearson (CXRO-LBNL)
ER?Filopodia
Cryo x-ray microscopy of 3T3 fibroblast cells
Organelle Details Imaged with CryogenicPreservation and High Spatial Resolution
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Bending Magnet Radiation Used With a Soft X-RayMicroscope to Form a High Resolution Image of a
Whole, Hydrated Mouse Epithelial Cell
hw = 520 eV
32 µm x 32 µm
Ag enhanced Au labelingof the microtubule network,color coded blue.
Cell nucleus and nucleoli,moderately absorbing,coded orange.
Less absorbing aqueousregions coded black.
W. Meyer-Ilse et al.J. Microsc. 201, 395 (2001)
Courtesy of C. Larabell and W. Meyer-Ilse (LBNL)
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
XM-2: A New, Upgraded MicroscopeDedicated to Soft X-Ray Biotomography
Dedicated to life sciences research Cryotomography without apparatus interruption Interchangeable objective lenses
(tradeoff resolution, depth of focus, working distance) Improved resolution, lens efficiency, image contrast
and uniformity Improved cryo transport Improved computational image reconstruction
and analysis More flexible use of phase contrast
National Center for X-ray Tomography
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
• High spatial resolution in transmission• Bulk sensitive (thin films)• Complements surface sensitive PEEM• Good elemental sensitivity• Good spin-orbit sensitivity• Allows applied magnetic field• Insensitive to capping layers• In-plane and out-of-plane measurements
Magnetic X-Ray Microscopy
Courtesy of P. Fischer, Wuerzberg and G.Denbeaux, CXRO/LBNL
Magnetic X-Ray Microscopy Using X-RayMagnetic Circular Dichroism (XMCD)
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
1 µm
SiN(70 nm)/Tb25(Fe75Co25)75(50 nm)/SiN(20 nm)/Al(30 nm)/SiN(20 nm)
MFM-image
P. Fischer et al., Wuerzburg; N. Takagi et al., Sanyo; G. Denbeaux et al., CXRO/LBNL
100 nm lines & spaces
Imaging of ThermomagneticallyWritten Bits in MO Media
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Magnetic Domains Imaged atDifferent Photons Energies
P. Fischer, T. Eimueller, M. Koehler (U. Wuerzberg)S. Tsunashima (U. Nagoya) and N. Tagaki (Sanyo)G. Denbeaux, L. Johnson, A. Pearson (CXRO-LBNL)
FeGd MultilayerContrastreversal
1 µm
hω = 720.5eV
Fe L2-edge
hω = 707.5eV
Fe L3-edge
hω = 704 eVbelow Fe L-edges
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Nanoscale Local Hysteresis
200nm
5 6
-3
0
Inte
nsity (
A.
U.)
Field (A. U.)
Hext
D.-H. Kim et al., J. Appl. Phys. (2005) accepted
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Electromigration in Latest TechnologyComputer Chips with Cu vias Connecting
Multilevel Metallization Layers
G. Denbeaux, E. Anderson, A. Pearson and B. Bates (CXRO)M. Meyer and E. Zschech (AMD Saxony Manufacturing GmbH) / E. Stach (NCEM / LBNL)
SEM micrograph X-ray micrograph imaged at 1.8 keV
X-rays
High current density
Cu interconnect
Cu via
Wafer
1 µm
HVTEM (0.8 MeV electrons)TXM (1.8 keV photons)
Courtesy of Gerd Schneider (BESSY)
Ch09_F08.modifVG.ai
Using Phase Effects to AchieveHigher Diffraction Efficiency
ZP
λ
f∆t
For a π-phase shift
a factor of four can be gained in diffraction efficiency. For soft x-rays and EUV all materials are partially absorbing
Optimization is a function of δ/β, asdiscussed by J. Kirz, J. Opt. Soc. Am. 64, 301 (1974) and by G.R. Morrison, Ch. 8 in A. Michette and C. Buckley, X-Ray Science and Technology (IOP, Bristol, 1993).
(3.29)
(3.12)
(9.25)
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
HardXRzoneplateMicros.ai
Hard X-Ray Zone Plate Microscopy
Professor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Images courtesy of the Synchrotron Radiation Research Center(SRRC), Taiwan Gung-Chian Yin Mau-Tsu Tangand Xradia, Concord, CA Wenbing Yun Michael Feser
Zone plate optical systemZone plate optical system Condenser TubeCondenser Tube
Monochromatic X-raysMonochromatic X-rays
The Transmission X-ray MicroscopeThe Transmission X-ray Microscope
10 cm
Ion ChamberIon Chamber
Phase RingPhase Ring
Sample mount and sampleSample mount and samplemanipulation systemmanipulation system
condenser
Zoneplateobjective
Image
The resolution reaches 30 nm. APL v89,221122,2006
3 µm
1 µm(a)
1 µm1 µm
3 µm (b)
(c) (d)
TXM with Zernike’s phase contrast method
HeLa cell with Nicole stained
1 µm
Plastic zoneplate of 1 µm thick
APL. Vol 88, 241115,2006The tomography close 60 nm.
3/20/2007 Berkeley CXRO 8
Nature: Aug Nature: Aug 20062006
3/20/2007 Berkeley CXRO 25
Application: Advanced IC DeviceFailure analysis and R&D of advanced IC devices
3/20/2007 Berkeley CXRO 52
SSRL nanoXCT installation• Installed Dec 2006 in 1 day• 1s exposure time at 8keV Zernike phase contrast• <30nm resolution in first order imaging mode
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
The Scanning Soft X-Ray Microscope
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
An Undulator Beamline forScanning X-Ray Microscopy
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Coherent Power for an EPU at the ALS
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Spectromicroscopy: High Spatial and High SpectralResolution Studies of Surfaces and Thin Films
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
RESULTS•Ni, Fe, Mn, Ca, K, O, C elemental map,( there was no sign of Cr.)•Different oxidation states for Fe and Ni
Protein (gray), Ca, K 700 705 710 715 720 725
OD
1.5
1.0
0.5
0
1 µm
Different oxidation states (minerals) found for Fe & Ni
Fe 2p
5 µm
Tohru Araki, Adam Hitchcock (McMaster University)Tolek Tyliszczak, LBNLSample from: John Lawrence, George Swerhone (NWRI-Saskatoon), Gary Leppard (NWRI-CCIW)
Biofilm from Saskatoon RiverALS-MES 11.0.2
ZP microscopy Apps2.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Map chemical spectra taken of pure samplesOnto a sample containing both components
M.K. Gilles, R. Planques, S.R. Leone LBNL
Samples from B. Hinsberg, F. Huele IBM Almaden
Exposure to UV light results in loss of carbonyl peak
280 eV 290 eV
Courtesy of Mary Gilles, LBNL
Patterned Polymer PhotoresistsALS-MES 11.0.2
Ch09_F43VG.ai
The Nanowriter: High Resolution Electron Beam Writing With High Placement Accuracy
High brightness thermal field emission source and extraction electrodes
Condenser lens, beam definingaperture and transfer lens
Blanking plates and aperture
50-100 keV electron beam focused to 3-10 nm spot size
Deflection coils
Final electron focusing lens
Deflectionelectronics Pattern
generator System controlcomputer
Thin resist recording layeron a multilevel wafer
Wafer stage (stationaryduring exposure)
Courtesy of E. Anderson, LBNLProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Ch09_Nanowriter_Apr04.ai
LBNL Nanowriter: Unique Ultra-high Resolution, High Accuracy Electron Beam Lithography Tool
Parameter
Beam size
Beam placement
Stitching
Beam voltage
Beam current
Speed
Deflection field
Interferometer
Wafer size
Real time detectionand feedback
Nanowriter
5.0 nm2.5 nm (New C3 lens)
2.5 nm (65 µm field)20 nm (512 µm field)
20 nm (1 cm field)
20-100 kV
1 nA at 10 nm1.0-0.2 nA at 2.5 nm (new C3 lens)
25 MHz
16 bit
λ/1024
8"
Backscattered, transmitted and secondary electrons;digital image processing
Key Specifications
Courtesy of E. Anderson, LBNLProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
ZP microscopy Apps1.pptProfessor David AttwoodUniv. California, Berkeley Zone Plate Microscopy and Applications, EE290F, 12 April 2007
Nanofabrication is Critical for High Fidelity,High Aspect Ratio Zone Plates
Courtesy of E. Anderson, A. Liddle, W. Chao, D. Olynick, and B. Harteneck (LBNL)
Etch resistantplating base
1. Expose
Si
Cross-linked polymerSi3N4
HSQ resist
6. Strip Si3N4 and Cr/Au Plating Base
Si
2. Develop
Si
Cross-linked polymerSi3N4
3. Cryogenic ICP Etch
Si
Si3N4
4. Plate
Si
Si3N4
5. Strip Resist
Si
Si3N4