Al2O31,2)TiO23-7)ZrO23,4)(SiO2)8-11)Ta2O512)13)(SS316L)14)

15,16)17)ZnO18)ITO19)IGZO20)

1.

2. SAM SAM SAM Silverman TiO2 SAM SAM 6)11-HUPA( :H399) SAM pH7.5 7 APTS( ) SAM

SAM ( 2)TiO2 Al2O3 SAM (SiO2) SAM Thissen SiO2 Al2O3 SAM 11)

1

2 SAM

1

3. SAM SAM SAM Silverman TiO2 SAM QCM(Quarts Crystal Microbalance) 4 SAM6)KlaukAl2O3SAMSAM2.5 XPS 21)Schwartz SAM SAM 3 5) OH H+ OH

< SAM >

SAM 1SiO2 T-BAG(Tethering by aggregation and growth) 9)1) *1) 25 mol/l*2) THF 2) 140 48 *3) 3) THF SAM *1) Piranha ( :30% H2O2=3:1)8,10) buzzard (30% H2O2:38% HCl=1:1)8) *2) 1 mmol/l 8,10) *3) 140 ( 10 ) 10)

SAM 2Al2O3 21)1) 5 mmol/l 2- 2) 16 2- 3) 60

SAM 3TiO2 6)1) 2002) 0.1 mmol/l THF (T-BAG 3) 120 48

SAM 4ITO 19)1) (0.5% SDS) 20 20 2) 1 mmol/l 1 3) 120 1

* ITO ( FLAT ITO20 mm x 20 mm) 1 FOPAODPAM-EG3-UPA11-HUPA11-PIUPA10-CDPA11-PUPA MC-PUPADF-PUPADC-PUPA 10 ITO 2

2

3 TiO2 SAM SAM5)

1 ITO

3

SAM 5SiO2 Al SAM 11)1) Piranha 80 30 2) 1 mmol/l AlCl3 3) 1 mmol/l 12

* 4 AlCl3 11)Al Al

< SAM >SAM(Contact Angle; CA)XPSX-ray photoelectron spectroscopy)FT-IR (Fourier transform infrared spectroscopy)AFM (Atomic force microscopy)

FT-IR SAM Gawalt SAM FT-IR 23)TiO2 ODPA( :O407) THF (0.75 mmol/ml)FT-IR2918 cm-12922 cm-1 ( 5: )ODPA (12018 ) (tape peel tests) ( 5: ) Gawalt SAM 2001 SAM

XPS SAM pH Bhairamadgi SAM XPS 24) 6 1- SAM (PAO) 1- (ODPA)SAMSAMH2OPBSpH 3pH 11 XPS PAO SAM pH 11 XPS H2OPBS pH 3 PAO SAM SAM

4 SAM SiO2Al

5 ODPA TiO2 FT-IR )()() ) ()SAM// 1) 6

6 SAM pH A)(B) SAM C)(D) PAO(ODPA)SAM A)(C) (B)(D) XPS

4

3XPS SAM Bhairamadgi 1- SAM PAO 1- (ODPA)SAM XPS 24) 7 SAM 80 SAM 500SiO2 SAMPAOSAM(10% T10 433 562 XPS PAO SAM

< SAM >

1. Klauk 21) Sekitani 22) Al2O3 ODPA SAM ( 8)XPS 4.6 /nm2 2.5

2. EL ITO Sharma ITO FOPA( : F329) ITO 19)FOPA264 ( 9)FOPA ITO EL

7 XPS SAM PAO (ODPA) SAM

8 SAM

9 FOPA ITO() FOPA ITO EL()

5

3. Wang ITO 25)P3HT PCBM ITO PEDOT:PSS (FOPAOPA)(Bare ITO)(2)

Wang SAM (Voc) SAM ITO FOPA OPA

4. ChockalingamITO SAM RGD ITO 26) SAM SAM ITO

5. TrainaY2O3 27) (C16-NP) (PEG-NP)

6. Pulsipher ITO 11-HUPA( H399) SAM 28)Zhang ZnO 10-CDPA ( :C490) SAM 18)Ma FDPA ( :F330) 29)

2 ITO

11 SAM Y2O3

10 SAM ITO

6

1) T. Hauffman, O. Blajiev, J. Snauwaert, C. van Haesendonck, A. Hubin, H. Terryn, "Study of the self-assembling of n-octylphosphonic acid layers on aluminum oxide", Langmuir, 2008, 24 (23), 13450.2) P. Thissen, M. Valtiner, G. Grundmeier, "Stability of Phosphonic Acid Self-Assembled Monolayers on Amorphous and Single-Crystalline Aluminum Oxide Surfaces in Aqueous Solution", Langmuir, 2010, 26 (1), 156.3) W. Gao, L. Reven, Solid-state NMR-studies of self-assembled monolayers, Langmuir, 1995, 11 (6), 1860.4) S. Marcinko, A. Y. Fadeev, "Hydrolytic Stability of Organic Monolayers Supported on TiO2 and ZrO2" , Langmuir, 2004, 20 (6), 22705) J. Schwartza, M. J. Avaltronia, M. P. Danahya, B. M. Silvermana, E. L. Hansona, J. E. Schwarzbauerb, K. S. Midwoodb, E. S. Gawalt, " Cell attachment and spreading on metal implant materials", J. Materials Science and Engineering C., 2003, 23, 395.6) B. M. Silverman, K. A. Wieghaus, J. Schwartz, Comparative properties of siloxane vs phosphonate monolayers on a key titanium alloy Langmuir, 2005, 21 (1), 225. 7) N. Adden, L. J. Gamble, D. G. Castner, A. Hoffmann, G. Gross, H. Menzel, "Phosphonic Acid Monolayers for Binding of Bioactive Molecules to Titanium Surfaces", Langmuir, 2006, 22, 8197.8) E. L. Hanson, J. Schwartz, B. Nickel, N. Koch, M. F. Danisman, Bonding self-assembled, compact organophosphonate monolayers to the native oxide surface of silicon, J. Am. Chem. Soc., 2003, 125 (51), 16074. 9) M. Dubey, T. Weidner, L. J. Gamble, D. G. Castner, " Structure and Order of Phosphonic Acid-Based Self-Assembled Monolayers on Si(100)", Langmuir, 2010, 26 (18), 14747.10) A. Vega, P. Thissen, Y. J. Chabal, "Environment-Controlled Tethering by Aggregation and Growth of Phosphonic Acid Monolayers on Silicon Oxide" Langmuir, 2012, 28, 8046.11) P. Thissen, A. Vega, T. Peixoto, Y. J. 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< >URL: www.dojindo.co.jpE-mail: info@dojindo.co.jp, Tel:096-286-1515 ( ), Fax:096-286-1525 Tel:03-3578-9651, Fax:03-3578-9650

< >

URL: http://wako-chem.co.jp 0120-052-099 0120-052-806

12 (2014/11/19) 3

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http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/C490http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/A517http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/H399http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/F340http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/F329http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/M457http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/F330http://dominoweb.dojindo.co.jp/goodsr7.nsf/View_Display/O407?OpenDocument