vlsi lect 5

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1 The Ideal Wire The Lumped Model The Lumped RC model The Distributed rc Line The Transmission Line Electrical wire models

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The Ideal Wire

The Lumped Model

The Lumped RC model

The Distributed rc Line

The Transmission Line

Electrical wire models

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Throughout most of the history of ICs, on-chip interconnect

wires were considered to be second class citizens that need

be considered only in special cases or when performing high-

precision analysis.

With the introduction of deep-submicron semiconductor

technologies, this picture is undergoing rapid changes.

The parasitic effects introduced by the wires display a

scaling behavior that differs from the active devices and

tend to gain in importance as device dimensions are reduced

and circuit speed is increased. 2

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In fact, they start to dominate some of the relevant

metrics of digital ICs such as speed, energy consumption,

and reliability.

This situation is aggravated by the fact that

improvements in technology make the production of ever

larger die sizes economically feasible, which results in an

increase in the average length of an interconnect wireand in the associated parasitic effects.

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Wiring of today’s ICs forms a complex geometry that

introduces capacitive, resistive, and inductive parasitics.

All three have multiple effects on the circuit behavior.

a) Increase in propagation delay

b) Impact on the energy dissipation and the power

distribution

c) Introduction of extra noise sources, which affects the

reliability of the circuit.

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A designer can decide to play it safe and include all these

parasitic effects in the analysis and design optimization

process. This conservative approach is non-constructive

and even non-feasible.

First of all, a ―complete‖ model is dauntingly complex

and is applicable only to very small topologies.

It is hence totally useless for today’s ICs with their

millions of circuit nodes.

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The circuit behavior at a given circuit node is determined

only by a few dominant parameters.

Bringing all possible effects to bear only obscures the

picture and turns the optimization and design process a

―trial-and-error‖ operation rather than an enlightened

and focused search.

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1) Inductive effects can be ignored if the resistance of the

wire is substantial — this is the case for long Al wires

with a small cross-section — or if the rise (fall) time of 

the applied signals is large.

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Fortunately, substantial simplifications often can be made.

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3) When the separation between neighboring wires is

large, or when the wires run together only for a short

distance, inter-wire capacitance can be ignored, and all

the parasitic capacitance can be modeled as capacitance

to ground.

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2) When the wires are short, or the cross-section of the

wire is large, or the interconnect material used has a low

resistivity, a capacitance-only model can be used.

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The circuit parasitics of a wire are distributed along its

length and are not lumped at a single position.

Yet, when only a single parasitic component is dominant,

or when the interaction between the components is small,

it is often useful (possible) to lump the different fractions

into a single circuit element.

The lumped model

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The advantage of this approach is that the effects of the

parasitic, then, can be described by an ordinary

differential equation.

Description of distributed elements requires PDEs.

As long as the resistive component of the wire is small and

the switching frequencies are in the low to medium range,

it is necessary to consider only the capacitive component

of the wire and to lump the distributed capacitance into a

single capacitor 10

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In this model, the wire still represents an equipotential

region, and the wire itself does not introduce any delay.

The only impact on performance is by the loading effect

of the capacitor on the driving gate.

This capacitive lumped model is simple, yet effective, and

is the model of choice for the analysis of most

interconnect wires in digital ICs.

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C lumped = L  cwire, with L the length of the wire and cwire

the capacitance per unit length. The driver is modeled as

a voltage source of source resistance R driver . 12

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While the lumped capacitor model is the most popular,

sometimes it is also useful to present lumped models of a

wire with respect to either resistance and inductance.

This is often the case when studying the supply

distribution network.

Both the resistance and inductance of the supply wires can

be interpreted as parasitic noise sources that introduce

voltage drops and bounces on the supply rails.

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The lumped RC model

On-chip metal wires of over a few mm length have a

significant resistance.

The equipotential assumption is no longer valid and aresistive-capacitive model has to be adopted

A first approach lumps the total wire resistance of eachwire segment into one single R and similarly combines the

capacitance into a single capacitor C - lumped RC model

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Consider the resistor-capacitor network below.

This network is called an RC tree

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This network has the following properties:

• the network has a single input node (labeled s)

• all the capacitors are between a node and the ground

• the network does not contain any resistive loops

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An interesting result of this topology is that there exists a

unique resistive path between the source node s and any

node i of the network. The total resistance along this path

is called the path resistance Rii. For example, the path

resistance between the source node s and node 4 is

R44 = R1 + R3 + R4

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The definition of the path resistance can be extended to

address the shared path resistance Rik, which represents

the resistance shared among the paths from the root

node s to nodes k and i:

For example, Ri4 = R1 + R3

and Ri2 = R1

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Assume now that each of the N nodes of the network is

initially discharged to GND, and that a step input is

applied at node s at time t = 0.

The Elmore delay at node i is then given by:

For the above circuit, the Elmore delay is:

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The designer should be aware that this time-constant

represents a simple approximation of the actual delay

between source node and node i.

Yet, in most cases this approximation has proven to be

quite reasonable and acceptable.

It offers the designer a powerful mechanism for

providing a quick estimate of the delay of a complex

network.

The Elmore delay is equivalent to the first-order time

constant of the network

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As a special case of the RC tree network, consider the

simple, non-branched RC chain (ladder) shown below.

This network is worth analyzing because it is a structurethat is often encountered in digital circuits, and also

because it represents an approximate model of a

resistive-capacitive wire.

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The Elmore delay of this chain network is:

This model can be used as an approximation of a

resistive-capacitive wire.

The wire with a total length of L is partitioned into N

identical segments, each with a length of L/N .

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The delay of a wire is a quadratic function of its length -

doubling the length of the wire quadruples its delay.

The delay of the distributed rc-line is one half of the delay

that would have been predicted by the lumped RC model.

The lumped RC model is pessimistic and inaccurate for

long interconnect wires, which are better represented by

the distributed rc model

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Voltage range Lumped RC

network

Distributed rc

network

0 to 50 % (tp) 0.69 RC 0.38 RC

0 to 63 % ( ) RC 0.5 RC

10 to 90% (tr) 2.2 RC 0.9 RC

0 to 90 % 2.3 RC RC

Step response of lumped and distributed RC

networks — points of interest

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Step response of a distributed rc line26

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a) Distributed rc delays need be considered only when

tpRC is comparable or larger than the tpgate of the driving

gate.

This defines a critical length Lcrit =

b) rc delays need be considered only when the rise (fall)

time at the line input is smaller than RC – R and C are

the total resistance and capacitance of the wire

Otherwise, lumped C model suffices27

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Propagation delay of 

the network can be

approximated as:

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The transmission line

When the switching speeds become sufficiently fast, and the

quality of the interconnect material become high enough so

that the resistance of the wire is kept within bounds, the

inductance of the wire starts to dominate the delay behavior,

and transmission line effects must be considered.

The lossless transmission line is appropriate for wires at the

PCB level

For interconnections in ICs, the lossy transmission line

model should be considered.

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X = 0X = L

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Step response for Rs = 5 Zo, ZL =

X = L

X = 0

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Step response for Rs = Zo, ZL =32

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Step response for Rs = Zo /5 , ZL =33

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To avoid potentially disastrous transmission line

effects such as ringing or large propagation

delays, the line should be terminated, either at the

source (series termination), or at the destination

(parallel termination), with a resistance equal to

the characteristic impedance of the line.

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The response of a lossy RLC line to a step combines wave

propagation with a diffusive component.

The step input still propagates as a wave through the

line. However, the amplitude of this traveling wave is

attenuated along the line

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Farther from the source, the more the response

resembles the behavior of a distributed rc line.

The resistive effect becomes dominant, and the line

behaves as a distributed rc line when R >>  Z0.

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1) Transmission line effects should be considered when

the rise (fall) time of the input signal t r (t f ) is smaller than

the time-of-flight of the transmission line ( t flight).

For on-chip wires with a length of 1 cm, one need worry

about transmission line effects only when t r < 150 ps.

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2) Transmission line effects should be considered only

when the total resistance of the wire is limited to R < 5 Zo

If this is not the case, the distributed rc model is more

appropriate.

Both the above constraints can be summarized in the

following set of bounds on the wire length:

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As transistor dimensions are reduced, the interconnect

dimensions must also be reduced to take full advantage of 

the scaling process.

A straightforward approach is to scale all dimensions of 

the wire by the same factor S as the transistors.

This might not be possible for at least one dimension of 

the wire - the length.

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Scaling of wires

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Length of local interconnections, that connect closely

grouped transistors, scales in the same way as transistors.

Global interconnections, that provide the connectivity

between large modules, display a different scaling

behavior. (clock signals and data and instruction buses)

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The average length of these long wires is proportional

to the die size of the circuit.

When scaling the wire length, we have to differentiate

between local and global wires.

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Assume that all other wire dimensions (W , H , t) scale with

the technology factor S.

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We consider three models: local wires (S L = S > 1), constant

length wires (S L = 1), and global wires (S L = SC < 1).

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Parameter Relation Local

wire

Constant

wire

Global

wire

W, H, t 1/S 1/S 1/S

L 1/S 1 1/Sc

C LW/t 1/S 1 1/Sc

R L/WH S S² S²/Sc

RC L²/Ht 1 S² (S /Sc)²

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This leads to the scaling behavior as

S

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Scaling of the technology does not reduce wire delay.

A constant delay is predicted for local wires, while the delay

of the global wires goes up - in contrast with the gate delay

which reduces from year to year

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In the local wires, density and low-capacitance are crucial,

while keeping the resistance under control is crucial in the

global wires.

To address these conflicting demands, modern interconnect

topologies combine a dense and thin wiring grid at the lower

metal layers with fat, widely spaced wires at the higher levels.

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