fabrication of large area sub-wavelength structures for anti-reflection optical film
DESCRIPTION
製作具次波長結構之大面積抗反射光學元件. Fabrication of large area sub-wavelength structures for anti-reflection optical film. Reporter ﹕Wen-Yu Lee Advisor : Cheng- Hsin Chuang Department of Mechanical Engineering, Southern Taiwan University of Science and Technology, Tainan, Taiwan Date: 2013/03/05. - PowerPoint PPT PresentationTRANSCRIPT
Fabrication of large area sub-wavelength structures for anti-reflection optical film
Reporter Wen-Yu Lee﹕Advisor : Cheng-Hsin Chuang
Department of Mechanical Engineering, Southern Taiwan University of Science and Technology, Tainan, Taiwan
Date: 2013/03/05
製作具次波長結構之大面積抗反射光學元件
Outline
2
Introduction
Experimental setup and results
Anti-reflection film measurement
Conclusions & Future works
Porous Anodic Alumina Oxide (AAO) Template
Nano imprinting process
The transmittance and reflectance measurement results
Comparing the results of different experiment parameters
Motivation
Types of Anti-reflection film
Outline
3
Introduction
Experimental setup and results
Anti-reflection film measurement
Conclusions & Future works
Porous Anodic Alumina Oxide (AAO) Template
Nano imprinting process
The transmittance and reflectance measurement results
Comparing the results of different experiment parameters
Motivation
Types of Anti-reflection film
4
Motivation
Reflection
Low contrast
Low contrastDecreased conversion efficiency
Low transmittance
Disadvantages of light reflection
n=1.5
Air n=1 Air n=1
n=1.5n=1.1~1.4
10%
5
Antireflective coating technology – Multilayer coatingAntireflective structure – Sub-wavelength structure
(SWSs)
Protective filmAntireflection
layerSubstrate with
hard coatingAdhesive layer
SeparatorThe refractive index of multilayer (Ladder)
High-cost facilities
Types of Anti-reflection film
6
Types of Anti-reflection filmAntireflective structure - Sub-wavelength structure (SWSs)
Moth eye structures
The reflective index of cylindrical SWSsThe reflective index of cone-shape SWSs
Information source : FINETECH JAPAN 2011
Multilayer coating
The lowest reflection and broadband
Sub-wavelength Structures(SWSs)
The best optical characteristicImprinting processLow-cost
How to achieve broadband and omnidirectional antireflection with low cost
process?
7
Types of Sub-wavelength structures (SWSs)Colloidal
lithography
RIE
Etching
Langmuir, 2009, 25 (13), pp 7375–7382
Interference lithography
Optics Communications 282 (2009) 434–438
Electron beam
lithography
BOE etching
KOH
etching
Solar Energy Materials & Solar Cells 94 (2010) 629–633
Electron beam lithography
Disadvantages• Complex• High-end facilities• Costly• Small size
Nano imprinting technique
Advantages Low-cost nano-scale mold Simple process The best optical characteristic Large area
Outline
8
Introduction
Experimental setup and results
Anti-reflection film measurement
Conclusions & Future works
Porous Anodic Alumina Oxide (AAO) Template
Nano imprinting process
The transmittance and reflectance measurement results
Comparing the results of different experiment parameters
Motivation
Types of Anti-reflection film
9
Experimental – Fabrication of AAO template
ProceduresAcid cleaning pure Al
foil
1st anodization process
Removed anodic oxide layer by acid
2nd anodization process
Pure aluminum
Schematic of the cross section
Process condition• Constant voltage of 80V• Oxalic acid solution (0.3M)• Temperature at 4℃
Oxalic acid solution Platinum(Pt)Oxalic acid solution Phosphoric acid
etching Platinum(Pt)
Anodizing + etchig = 1 time (1st cycle)• Phosphoric acid solution (5wt%)• Temperature at 32℃
Anodizing + etchig = 1 time (2nd cycle)
10
Experimental result – Different 2nd anodization time Top view High purity aluminum foil
Cross section view
30sec 45sec 60sec
30sec 45sec 60sec
Aspect ratio 1:1 Aspect ratio 1:1.5 Aspect ratio 1:2
11
Experimental result – Different 2nd anodization time Top view Sputtering aluminum membrane with temper, widening time 10 min
Cross section view
30sec 45sec
30sec 45sec
Aspect ratio 1:1.2 Aspect ratio 1:2.5
12
Experimental result – Different Pore widening time Top view
15min
15min
Aspect ratio 1:1.5
Cross section view
10min
10min
Aspect ratio 1:2.5
Sputtering aluminum membrane with temper, widening time 10 min
13
Experimental result – Compare the results of temper
Anodizing time 45sec , widening time 15 min
5 ̊C / min
400 ̊C, 4hr
Rapid cooling
400
SEM images of AAO template
Tempering status Tempering champer
Without temper With temper
14
Experimental process – Nano imprinting process AAO template with cone structure
Schematic of nanoimprinting process by using UV exposure technique.
AAO template
Nano imprinting Process
UV curablePET substrate
Anti-reflection FilmPET substrate
Sub-wavelength structures
Roller UV light
Ontic photo
AAO template
Anti-reflection Film
0.5
15
Experimental result – Nano imprinting process byusing AAO template
AAO template SWSsAluminum substrate
45sec, 10min
Aspect ratio 1:1
Sputtering Al membrane(without temper)
45sec, 15min
Sputtering Al membrane
30sec, 10min
Sputtering Al membrane
45sec, 15min
Sputtering Al membrane
Aspect ratio 1:1
Aspect ratio 1:1
Aspect ratio 1:1.5
Aspect ratio 1:2
Outline
16
Introduction
Experimental setup and results
Anti-reflection film measurement
Conclusions & Future works
Porous Anodic Alumina Oxide (AAO) Template
Nano imprinting process
The transmittance and reflectance measurement results
Comparing the results of different experiment parameters
Motivation
Types of Anti-reflection film
17
Optical measurements results – Transmittance (%) Transmittance and of the glass plate with/without
SWSs
89.7%
91.8%
92.9%
94.2%95.1%
Asp
ect r
atio
incr
ease
d
18
Optical measurements results – Reflectance (%) Reflectance and of the glass plate with/without the SWSs
60 ̊45 ̊30 ̊15 ̊5 ̊
Wavelength (nm)
Ref
lect
ance
(%)
Incident light angles
1%0.14%
0.16%
0.26%
0.64%
Aspect ratio increased
Outline
19
Introduction
Experimental setup and results
Anti-reflection film measurement
Conclusions & Future works
Porous Anodic Alumina Oxide (AAO) Template
Nano imprinting process
The transmittance and reflectance measurement results
Comparing the results of different experiment parameters
Motivation
Types of Anti-reflection film
20
ConclusionsThis study successfully fabricated the large area AAO template by using homemade Circulate-coolded etching system.
In the fabrication of large area cone-shape AAO template, we could control the different depth characteristics of anodic alumina by phosphoric acid etching process and anodization parameters.
We have successfully produced sub-wavelength structures(SWSs) on glass plant by using hot embossing with AAO template
In the optical measurement results, the average transmittance of glass plate with SWSs was 96.5% and the reflection was reduced from 5.71% to 0.2%.
Due to the contact angle of high-aspect-ratio SWSs film exceeded 110°, the surface energy is much lower than bare glass whose contact angle is 25°. Consequently, a SWSs film could possess the self-cleaning effect.
21
Thanks for your attention!